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More Vacuum System Information

There is a chance that you may create a virtual leak. [Pg.467]

Once a system is (temporarily) repaired, there is a good chance that the need for a permanent repair will drop ( out of sight, out of mind ). Temporary repairs are, at best, temporary and should not be relied on for future needs. [Pg.467]

Glyptol, or other temporary leak repair material, can be very difficult to properly remove from a glass surface. Total removal of any temporary sealant must be done before any glassworking can be done. [Pg.467]

Obviously there will be times when the temporary repair of a leak is essential, but otherwise it is best to make all repairs permanent. [Pg.467]

After a leak has been discovered and removed and the glass repaired, flame-annealed, and cooled, the system must be leak checked again not only to verify that the repair was successful, but to see if there are any other leaks that need repair. It is not uncommon for another leak to be immediately adjacent to the first leak. An adjacent, smaller may be unable to attract the spark from a Tesla coil away from a larger leak. Or, a larger leak can cause too much helium noise for a smaller leak to be pinpointed. However, once larger leaks are repaired, smaller leaks can be more readily identified. [Pg.467]


This determination is assuming that you have a perfectlydesigned vacuum system with no narrow passageways, no extra chambers, no bends, no contamination, and no traps, baffles, or stopcocks. Not much of a vacuum system, but it sure would be fast. Because you are working in the real world, the real pumping time will be slower. To compensate for this slower time, it can be helpful to multiply the above result by 2 or 3 to ensure that the pump will be adequate to handle your system s needs. However, as a tool for approximating the minimum size needed, the above formula is usually sufficient. The final decision of what pump to purchase, as in all selections, will depend on what you are willing to settle for and/or what you can afford. (More information on pump speeds is provided in Sec. 7.3.10.)... [Pg.348]

Improper selection of coolant for a cold trap may artificially limit the potential vacuum of your system. For instance, the vapor pressure of water (which is often the primary condensable vapor in many vacuum systems) is quite high without any cold trapping, moderate at dry-ice temperatures, and negligible at liquid nitrogen temperatures (see Table 7.11). If your vacuum needs are satisfied within a vacuum of 5 x 10"4 torr, you can safely use dry ice (and save money because dry ice is less expensive than liquid nitrogen). Another temperature option for a coolant is the slush bath (for more information on coolants see Sec. 6.2). [Pg.394]

Specific information on the design of power amplifier systems using vacuum tubes can usually be obtained from the manufacturers of those devices. More general application information can be found in the following pubHcations ... [Pg.424]

This equation then could be used as an approximation to relate the conformational energies ( ) in various solvents, where vac is the electrostatic energy in vacuum, and D is the effective dielectric constant of the solution. These D numbers range from 2 up to 10 or so for most solvents. When D is 10 or higher, the electrostatic effect is essentially wiped out. The effective dielectric constant of a solvent is usually smaller than the bulk value, since the interior of the molecule is usually hydrocarbon with a D value of about 2. The electric field interacts partly through the molecule, and partly empty space (vacuum, D = 1) or solvent This equation is, of course, an approximation, but a good enough approximation to be useful. In more polar systems, better approximations are usually desirable. In the absence of other information, the value of D in solution in polar solvents has been widely taken to be 4. [Pg.179]

Sputtering a sample yields secraidary irais which ccmtain analytical information characteristic of the sample. Several types of SIMS instmments are available to perform the analytical measurements. The basic components are a primary imi source, a sample chamber, a mass spectrometer, a secondary ion detectiOTi system, a vacuum system, and a data acquisition system as illustrated in Fig. 4.3. There are many variations and combinations of the basic components and it is beymid the scope of this chapter to comprehensively cover all instrumentation so only some general and more conmuMi types will be discussed. An in-depth discussion on SIMS instrumentation is provided in the very comprehensive SIMS reference by Benninghoven et al. [10] and in the instrumentation chapter of reference [11]. As SIMS has expanded into more areas of analysis, it has become more difficult to have one instrument to perform all types of analysis so instrument development has trended toward dedication to specific applications [12]. [Pg.138]

The chapter on Compression in Volume 3 of this series presents details of several mechanical vacuum units, and this information will not be repeated here. However, more specific vacuum units and system related data is given. [Pg.382]

The strength of the surface science approach is that it can address the molecular details of catalytic issues by pooling information from a battery of specific analytical spectroscopies and techniques [174], As more complex model systems are developed, the wealth of characterization techniques available in vacuum environments can be used to better understand catalysis. [Pg.26]

The birth of the microcomputer can actually be traced back to the development of the transistor. With early electronic devices and computers the system of storing digital information was based on the use of vacuum tubes. These were cumbersome, expensive, and used a tremendous amount of power. They were much faster than relays, however, they were considerably slower than anything produced under today s standards. With the development of the transistor a revolution in the design of computer systems ushered in the time when systems would become smaller and more capable and less costly. The transistor was faster than its predecessor, the vacuum tube, required less power and was much cheaper to develop and produce than the vacuum tube technology. [Pg.3]


See other pages where More Vacuum System Information is mentioned: [Pg.467]    [Pg.467]    [Pg.469]    [Pg.471]    [Pg.467]    [Pg.467]    [Pg.469]    [Pg.471]    [Pg.372]    [Pg.55]    [Pg.17]    [Pg.76]    [Pg.118]    [Pg.406]    [Pg.431]    [Pg.435]    [Pg.544]    [Pg.95]    [Pg.146]    [Pg.610]    [Pg.458]    [Pg.592]    [Pg.1021]    [Pg.486]    [Pg.9]    [Pg.5556]    [Pg.192]    [Pg.247]    [Pg.154]    [Pg.178]    [Pg.344]    [Pg.52]    [Pg.245]    [Pg.57]    [Pg.116]    [Pg.402]    [Pg.42]    [Pg.43]    [Pg.57]    [Pg.106]    [Pg.231]    [Pg.344]    [Pg.95]    [Pg.719]    [Pg.445]   


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