Mirror layer

After conception of the test structures by LAM and LAAS researchers, several samples have been realized at LAAS. Our first goal is the realization of a high quality and flat surface on top of a "mountainous" structure, in order to make the mirror layer. This layer is of first importance as it sees the photons of the instrument and it has to be completely planarized. 

Vertical emission can also be achieved by the application of dielectric Bragg mirrors layers, which is in principle the DBR structure applied to the direction of the him normal. Such microcavities have been shown to alter the (electroluminescence spectrum of devices as well as the angular radiation characteristics [200-204], Normally, the angular dependence of the emission from a thin him follows Lambert s law [205]. 

In the equations, T = transmittance of a single mirror layer, R = reflectance of a single mirror layer, A =absorption of a single layer, x = order of interference, nsts = optical thickness of the spacer layer and a = angle of radiation within the layers. 

In the extra-layer approach, all particles that lie within the cutoff radius Vc from the boundary are mapped into an extra layer that extends beyond the simulation domain. Figure 4 illustrates the concept. The velocities of the particles in the extra layer are chosen such that the mean of the velocity of the mirrored particle and the velocity of the original DPD particle gives the velocity at the wall. This algorithm has been reported to work well when used for calculating the dissipative force and the random force between the particles. But, if the conservative force is calculated using this method, oscillations are observed in the density near the wall. This problem arises because of the lack of spatial correlation between the particles in the boundary layer and the mirror layer. To overcome this problem, an additional layer for calculating the conservative component alone can be employed, as illustrated in Fig. 5. 

The second sacrificial PSG layer, Oxide2, is deposited and chemomechanically polished (CMP) to remove undesired topography resulting from features etched in the underlying layers, greatly improving the surface finish of the final polysilicon mirror layer. 

---