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Microwave plasma CVD

Microwave Plasma CVD reactors use very similar conditions to hot filament reactors, and despite being significantly more expensive, are now among the most widely used techniques for diamond growth. In these... [Pg.79]

Conditions for the deposition of diamond using microwave plasma CVD... [Pg.1058]

Chen, C.-F., Huang, Y. C., Hosomi, S. and Yoshida, I. (1989), Effect of oxygen addition on microwave plasma CVD of diamond from CH4-H2 mixture. Mater. Res. Bull., 24(1) 87-94. [Pg.87]

Ralchenko, V., Sychov, I., Vlasov, I., Vlasov, A., Konov, V., Khomich, A. and Voronina, S. (1999), Quality of diamond wafers grown by microwave plasma CVD Effects of gas flow rate. Diam. Relat. Mater., 8(2-5) 189-193. [Pg.95]

Yoshikawa, H., Morel, C. and Koga, Y. (2001), Synthesis of nanocrystalline diamond films using microwave plasma CVD. Diam. Relat. Mater., 10(9-10) 1588-1591. [Pg.98]

A.7.1. Microwave plasma CVD reactors A.7.2. Hot filament CVD reactor A.7.3. DC plasma CVD reactor A.8. Crystal growth modes A.9. Carbon materials A. 10. Miscellaneous notations... [Pg.291]

There are several types of microwave plasma CVD (MPCVD) reactors designed by several organizations. The widely known reactors are presented in Section 3 ... [Pg.296]

NIRIM-type A microwave plasma CVD reactor developed by National Institute for Research in Inorganic Materials (NIRIM), Japan. This laboratory is now called National Institute for Materials Science (NIMS). [Pg.296]

H. Itoh, T. Osaki, H. Iwahara, and H. Sakamoto, Nucleation control of diamond synthesized by microwave plasma CVD on cemented carbide substrate, J. Mater. Sci., 1991,26(14) 3763-3768 (1991)... [Pg.179]

Figure 2-38 A schematic view of the mist microwave-plasma CVD system developed at Tokyo University/TSK Toyo Oxygen. (From Takahashi et al. [256].)... Figure 2-38 A schematic view of the mist microwave-plasma CVD system developed at Tokyo University/TSK Toyo Oxygen. (From Takahashi et al. [256].)...
Other variations on the CVD method, such as hot-wire CVD (HWCVD) [66], rapid thermal CVD (RTCVD) [67], microwave plasma CVD (MPCVD) [68], and the floating catalyst technique [69,70] have led to improvements in product controllability, yield, and cost. [Pg.217]

Wu Y, Kuroda M, Sugimura H, Inoue Y, Takai O (2003) Nanotextures fabricated by microwave plasma CVD application to ultra water-repellent siu-face. Surf Coat Technol 174-175 867-871... [Pg.428]

Zhong GF, Iwasaki T, Honda K, Fumkawa Y, Ohdomari I, Kawarada H. Very high yield growth of vertically aligned single-walled carbon nanotubes by point-arc microwave plasma CVD. Chem Vap Depos 2005 11 127-30. [Pg.173]

SiC nanofibers were synthesized by Honda et cd. on Si substrates covered by Ni thin films using high-power microwave plasma CVD under hydrogen gas [117]. The resultant fibrous material was identified as (3-SiC with a high crystallinity. SiC nanofibers were also fabricated by these authors using the VLS mechanism, in which SiC is precipitated from supersaturated liquid Ni nanoballs. [Pg.148]


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