Microelectronics rinse water

Dehydration The growing use of isopropanol as a clean-rinse fluid in microelectronics produces significant quantities of an 8.5-90 percent isopropanol waste. Removing the water and trace contan ii-nants is required before the alcohol can be reused. Pervaporation produces a 99.99 percent alcohol product in one step. It is subsequently polished to remove metals and organics. In Europe, dehydration or ethanol is the largest pei vaporation application. For the very large ethanol plants typical of the United States, pei vaporation is not competitive with thermally integrated distillation. 

Process water applications include boiler water feed pretreatment before ion exchange or electrodialysis. RO is also used for ultrahigh-purity water production for use in laboratories, medical devices (kidney dialysis), microelectronic manufacturing (rinse fluids per ASTM D-19 D5127-90, 1990), and pharmaceutical manufacturing (purified water or water for injection as specified by USP). 

Ultrapure water is used in the microelectronics industry for appHcations such as rinsing and washing wafer surfaces between chemical etching steps and immersion... 

---