Metals hydrofluoric acid

Pyridines containing leaving groups (Hal, SO2R, NO2) in position 2 are often used as starting materials for preparation of 2-fluoropyridines in nucleophilic substitution reactions. Typical nucleophiles are fluorides of alkaline metals, hydrofluoric acid, tetrabutylammonium fluoride, and fluoroboric acid. Although this... 

Anhydrous hydrogen fluoride (as distinct from an aqueous solution of hydrofluoric acid) does not attack silica or glass. It reacts with metals to give fluorides, for example with heated iron the anhydrous iron(II) fluoride is formed the same product is obtained by displacement of chlorine from iron(II) chloride ... 

In addition to the abnormal properties already discussed, aqueous hydrofluoric acid has the properties of a typical acid, attacking metals with the evolution of hydrogen and dissolving most metallic hydroxides and carbonates. 

Tantalum is a gray, heavy, and very hard metal. When pure, it is ductile and can be drawn into fine wire, which is used as a filament for evaporating metals such as aluminum. Tantalum is almost completely immune to chemical attack at temperatures below ISOoC, and is attacked only by hydrofluoric acid, acidic solutions containing the fluoride ion, and free sulfur trioxide. Alkalis attack it only slowly. At high temperatures, tantalum becomes much more reactive. The element has a melting point exceeded only by tungsten and rhenium. Tantalum is used to make a variety... 

Hexafluoroarsenic acid [17068-85-8] can be prepared by the reaction of arsenic acid with hydrofluoric acid or calcium fluorosulfate (29) and with alkaH or alkaline-earth metal fluorides or fluorosulfonates (18). The hexafluoroarsenates can be prepared directly from arsenates and hydrofluoric acid, or by neutrali2ation of HAsF. The reaction of 48% HF with potassium dihydrogen arsenate(V), KH2ASO4, gives potassium hydroxypentafluoroarsenate(V)... 

Colorless crystals of iron(II) fluoride tetrahydrate [13940-89-1Fep2 4H2O, can be obtained by dissolving metallic iron or the anhydrous salt in hydrofluoric acid. The crystals of Fep2 4H2O are sparingly soluble in water and decompose to Fe202 when heated in air. 

Stannous fluoride probably was first prepared by Scheele in 1771 and was described by Gay-Lussac and Thenard in 1809. Commercial production of stannous fluoride is by the reaction of stannous oxide and aqueous hydrofluoric acid, or metallic tin and anhydrous hydrogen fluoride (5,6). Snp2 is also produced by the reaction of tin metal, HP, and a halogen in the presence of a nitrile (7). 

Titanium trifluoride is prepared by dissolving titanium metal in hydrofluoric acid (1,2) or by passing anhydrous hydrogen fluoride over titanium trihydrate at 700°C or over heated titanium powder (3). Reaction of titanium trichloride and anhydrous hydrogen fluoride at room temperature yields a cmde product that can be purified by sublimation under high vacuum at 930—950°C. 

Iron(II) fluoride tetrahydrate [13940-89-17, Fep2 4H2O, is prepared by dissolving iron metal ia warm hydrofluoric acid and precipitating with ethanol. The stmcture of the soHd consists of discrete [FeF2(H20)4] octahedra ia which F and H2O are randomly distributed over the possible sites. The white sohd turns brown ia air and decomposes at 100°C. It is slightly soluble ia water, alcohol, and ether and is soluble ia dilute acid. 

Re OPe . The final step in the chemical processing of rare earths depends on the intended use of the product. Rare-earth chlorides, usually electrolytically reduced to the metallic form for use in metallurgy, are obtained by crystallisation of aqueous chloride solutions. Rare-earth fluorides, used for electrolytic or metaHothermic reduction, are obtained by precipitation with hydrofluoric acid. Rare-earth oxides are obtained by firing hydroxides, carbonates or oxalates, first precipitated from the aqueous solution, at 900°C. 

If conditions aie such that the film does not form, such as in the case of acids, then the reaction proceeds until all the metal is consumed. The reaction of magnesium with hydrofluoric acid [7664-39-3J is an exception to this rule, because a stable fluoride film forms. 

Niobium Penta.fIuoride, Niobium pentafluoride is prepared best by direct fluorination of the metal with either fluorine or anhydrous hydrofluoric acid at 250—300°C. The volatile NbF is condensed in a pyrex or quartz cold trap, from which it can be vacuum-sublimed at 120°C to yield colorless monoclinic crystals. It is very hygroscopic and reacts vigorously with water to give a clear solution of hydrofluoric acid and H2NbOF ... 

Hydrated amorphous silica dissolves more rapidly than does the anhydrous amorphous silica. The solubility in neutral dilute aqueous salt solutions is only slighdy less than in pure water. The presence of dissolved salts increases the rate of dissolution in neutral solution. Trace amounts of impurities, especially aluminum or iron (24,25), cause a decrease in solubility. Acid cleaning of impure silica to remove metal ions increases its solubility. The dissolution of amorphous silica is significantly accelerated by hydroxyl ion at high pH values and by hydrofluoric acid at low pH values (1). Dissolution follows first-order kinetic behavior and is dependent on the equilibria shown in equations 2 and 3. Below a pH value of 9, the solubility of amorphous silica is independent of pH. Above pH 9, the solubility of amorphous silica increases because of increased ionization of monosilicic acid. 

Tantalum is not resistant to substances that can react with the protective oxide layer. The most aggressive chemicals are hydrofluoric acid and acidic solutions containing fluoride. Fuming sulfuric acid, concentrated sulfuric acid above 175°C, and hot concentrated aLkaU solutions destroy the oxide layer and, therefore, cause the metal to corrode. In these cases, the corrosion process occurs because the passivating oxide layer is destroyed and the underlying tantalum reacts with even mild oxidising agents present in the system. 

Zirconium is readily attacked by acidic solutions containing fluorides. As Httle as 3 ppm flouride ion in 50% boiling sulfuric acid corrodes zirconium at 1.25 mm/yr. Solutions of ammonium hydrogen fluoride or potassium hydrogen fluoride have been used for pickling and electropolishing zirconium. Commercial pickling is conducted with nitric—hydrofluoric acid mixtures (see Metal surface treatments). 

Zirconium carbide is inert to most reagents but is dissolved by hydrofluoric acid solutions which also contain nitrate or peroxide ions, and by hot concentrated sulfuric acid. Zirconium carbide reacts exothermically with halogens above 250°C to form zirconium tetrahaHdes, and with oxidizers to zirconium dioxide in ak above 700°C. Zirconium carbide forms soHd solutions with other transition-metal carbides and most of the transition-metal... 

Qua.driva.Ient, Zirconium tetrafluoride is prepared by fluorination of zirconium metal, but this is hampered by the low volatility of the tetrafluoride which coats the surface of the metal. An effective method is the halogen exchange between flowing hydrogen fluoride gas and zirconium tetrachloride at 300°C. Large volumes are produced by the addition of concentrated hydrofluoric acid to a concentrated nitric acid solution of zirconium zirconium tetrafluoride monohydrate [14956-11-3] precipitates (69). The recovered crystals ate dried and treated with hydrogen fluoride gas at 450°C in a fluid-bed reactor. The thermal dissociation of fluorozirconates also yields zirconium tetrafluoride. 

BeryUium reacts readUy with sulfuric, hydrochloric, and hydrofluoric acids. DUute nitric acid attacks the metal slowly, whereas concentrated nitric acid has Httle effect. Hot concentrated alkaUes give hydrogen and the amphoteric beryUium hydroxide [13327-32-7] Be(OH)2. Unlike the aluminates, the beryUates are hydrolyzed at the boU. 

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