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Metals Fermi level

This allows a direct influence of the alloying component on the electronic properties of these unique Pt near-surface formations from subsurface layers, which is the crucial difference in these materials. In addition, the electronic and geometric structures of skin and skeleton were found to be different for example, the skin surface is smoother and the band center position with respect to the metallic Fermi level is downshifted for skin surfaces (Fig. 8.12) [Stamenkovic et al., 2006a] owing to the higher content of non-Pt atoms in the second layer. On both types of surface, the relationship between the specific activity for the oxygen reduction reaction (ORR) and the tf-band center position exhibits a volcano-shape, with the maximum... [Pg.259]

Figure 2.4 Shift of the metal Fermi level on application of an overpotential, which is the equilibrium potential fa of the redox couple, is ... Figure 2.4 Shift of the metal Fermi level on application of an overpotential, which is the equilibrium potential fa of the redox couple, is ...
The position < >m of the metal Fermi level versus vacuum level (its work function ) is known experimentally and varies from —2.15 eV for cesium... [Pg.602]

Now imagine superimposed on this variable-energy sea of electrons the P-P and o bands for some typical, moderately bonding P-P distance, 49. In the middle of the transition series, the metal Fermi level is above the P-P a. Both a and o are occupied, so there is no resultant P-P bond. As P-P stretches in response, the a only becomes more filled. On the right side of the transition series, the P-P a is above the Fermi level of the metal, and so is unfilled. The filled P-P o makes a P-P bond. Making the P-P distance shorter only improves this situation. [Pg.65]

Figure 3. Energy diagram for free electrons in a metal. The positive background charge of the core ions leads to a potential energy well with respect to the energy of the electron in vacuum vac- The averaged kinetic energy of the free electrons is indicated with dashed lines 3/2 k%T according to the Drude model, and 3/5 according to the Sommerfeld model. The electrochemical potential of the electrons in the metal [Fermi level] is also indicated. Figure 3. Energy diagram for free electrons in a metal. The positive background charge of the core ions leads to a potential energy well with respect to the energy of the electron in vacuum vac- The averaged kinetic energy of the free electrons is indicated with dashed lines 3/2 k%T according to the Drude model, and 3/5 according to the Sommerfeld model. The electrochemical potential of the electrons in the metal [Fermi level] is also indicated.
Denoting the energy (E - Ap ) of any state in the metal with respect to the metal Fermi level as e, the macroscopic rate constant kXU) for reduction is obtained by summing, over all e, the microscopic rate coefficients for ET from an occupied state of... [Pg.250]

Figure 4.23 Quenching of photoexcitation at a metal electrode. On photoexcitation of a sensitiser molecule S at the metal surface (step 1), the electron readily transfers from the LUMOof S into an empty state above the Fermi level of the metal (step 2), but the hole in the HOMO is rapidly filled by back ET from an occupied state below the metal Fermi level (step 3). The order of steps 2 and 3 may be reversed but the effect is still rapidly to quench S. ... Figure 4.23 Quenching of photoexcitation at a metal electrode. On photoexcitation of a sensitiser molecule S at the metal surface (step 1), the electron readily transfers from the LUMOof S into an empty state above the Fermi level of the metal (step 2), but the hole in the HOMO is rapidly filled by back ET from an occupied state below the metal Fermi level (step 3). The order of steps 2 and 3 may be reversed but the effect is still rapidly to quench S. ...
This case is analyzed using the H -levels and the H-Al interactions given in Fig. 6 and Table 1, respectively. As the H -level is always above the metal Fermi level, we can use semiclassical master equations for solving the Newns-Anderson Hamiltonian of this problem [21,22]. [Pg.192]

Most predict maximum enhancements of about a 100. The excitation frequency is related to the energy difference between the metal Fermi level and the molecular LUMO and HOMO, i.e., these models are molecule sensitive. [Pg.334]

Furthermore, sudden jumps occur in the /(F)-characteristics and can be attributed to the situation when the metal Fermi level passes a discrete trap level at increasing voltage and fills-up the respective trap states. [Pg.557]

From conventional semiconductor electronics, it is known that creating a low-resistance ohmic contact requires alignment of the metal Fermi level (Ep) with the... [Pg.140]

Figure 5. Ener level shematics at the metal/polymer interface. The formation of bipolaron lattice at the interface depends on the relative positions of the metal Fermi level and the bipolarons. At the interface, Ca will tend to form negative bipolarons (a), A1 will not form bipolarons (b) and Au will tend to form positive bipolarons (c). Although bipolarons extend over several monomeric units, they span only 4 units in this diagram (33). We iUustrated the bipolarons with PPV chains. Figure 5. Ener level shematics at the metal/polymer interface. The formation of bipolaron lattice at the interface depends on the relative positions of the metal Fermi level and the bipolarons. At the interface, Ca will tend to form negative bipolarons (a), A1 will not form bipolarons (b) and Au will tend to form positive bipolarons (c). Although bipolarons extend over several monomeric units, they span only 4 units in this diagram (33). We iUustrated the bipolarons with PPV chains.
Similarly, the Schottky barrier height for holes is the difference between the valence band maximum of the semiconductor and the metal Fermi level, measured with respect to... [Pg.797]

Similarly, in a metal/semiconductor junction, in which the metal work function lies between the valence band maximum and the conduction band minimum, the tails of the metallic wave function decrease exponentially in the adjacent semiconductor gap states, inducing transfer of charge, which in turn creates the dipole. The mismatch between the metal Fermi level and E is reduced by this dipole (by a factor inversely proportional to the semiconductor s optical dielectric constant, s o, in first approximation [51]). Only in the case of semiconductors with a large optical dielectric constant or high density of interface states is the Fermi level almost completely pinned at E- In this case, since E is an intrinsic property of the semiconductor, the Schottky barrier height of a particular semiconductor is independent of the metal (and its work function) utilized as contact. In order to define the CNL, one... [Pg.799]


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See also in sourсe #XX -- [ Pg.262 ]

See also in sourсe #XX -- [ Pg.448 ]




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