Materials, decomposition metals

Chemical Reactivity - Reactivity with Water Reacts slowly with water at room temperature to form limewater and oxygen gas Reactivity with Common Materials Heavy metals and dirt can accelerate decomposition to lime and oxygen. The reaction is not explosive Stability During Transport Stable Neutralizing Agents for Acids and Caustics Flush with water Polymerization Not pertinent Inhibitor of Polymerization Not pertinent. 

Oil, charcoal, other organic materials powdered metals reducing agents strong acids alkyl esters hypochlorites Decomposition/combustion oxides of nitrogen, ammonia May detonate with strong shock or if heated A confined... 

If solid samples are insoluble in water, some decomposition procedure must be used. For inorganic materials, decomposition with mineral acids is most often employed (for a survey of decomposition techniques see [33]). When the sample cannot be dissolved in an acid, it can either be fused (most often with alkali carbonates, hydroxides or their mixtures [157, 47]) or sintered (usually with mixtures of alkali carbonates with divalent metal oxides, sometimes in the presence of oxidants [54]). Sintering is usually preferable, because then contamination of the sample and the resultant ionic strength are lower than is the... 

Organoindium substances are important, especially for the production of materials by metal-organic chemical vapor-phase deposition (MOCVD). This technique involves the thermal decomposition of mixtures of an organoindium compound and a compound such as phosphine (PH3), leading to the deposition of ordered layers of InP. The resulting compound can be used in the formation of semiconductors and solid-state optical devices (similar to silicon), see also Inorganic Chemistry. 

This chapter is intended to cover major aspects of the deposition of metals and metal oxides and the growth of nanosized materials from metal enolate precursors. Included are most types of materials which have been deposited by gas-phase processes, such as chemical vapor deposition (CVD) and atomic layer deposition(ALD), or liquid-phase processes, such as spin-coating, electrochemical deposition and sol-gel techniques. Mononuclear main group, transition metal and rare earth metal complexes with diverse /3-diketonate or /3-ketoiminate ligands were used mainly as metal enolate precursors. The controlled decomposition of these compounds lead to a high variety of metal and metal oxide materials such as dense or porous thin films and nanoparticles. Based on special properties (reactivity, transparency, conductivity, magnetism etc.) a large number of applications are mentioned and discussed. Where appropriate, similarities and difference in file decomposition mechanism that are common for certain precursors will be pointed out. 

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