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Lithography resolution

Vieu C, Carcenac F, Pepin A. Electron beam lithography Resolution limits and applications Appl Surf Sci 2000 164 111-7(7). [Pg.719]

Vieu, C., Carcenac, F., Pepin, A., Chen, Y., Mejias, M., Lebib, A., Manin-Ferlazzo, L., Couraud, L., Launois, H. Electron beam lithography resolution limits and applications. Appl. Surf. Sci. 164, 111-117 (2000)... [Pg.400]

Vieu, C., et al., 2000. Electron beam lithography resolution limits and apphcations. Applied Surface Science 164 (1), 111-117. [Pg.28]

Broers, A.N., Hoole Andrew, A.C.F., Ryan, J.M., 1996. Electron beam lithography— resolution limits. Microelectron. Eng. 32, 131-142. [Pg.356]

One method for obtaining a high masking speed and resolution with X-ray lithography is use of highly sensitive positive resists. This paper reports some investigations on such sensitive positive X-ray resists. [Pg.276]

Contact lithography can be used to spatially control the photosubstitution process to form laterally resolved bicomponent films with image resolution below 10 pm. Dramatic changes occur in the colors and redox potentials of such ruthenium(II) complexes upon substitution of chloride for the pyridine ligands (Scheme 1). Striped patterns of variable colors are observed on addressing such films with a sequence of potentials. [Pg.586]

Hua, E et al. 2004. Polymer imprint lithography with molecular-scale resolution. Nano Lett. 4 2467-2471. [Pg.443]

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See also in sourсe #XX -- [ Pg.83 , Pg.84 , Pg.85 , Pg.86 , Pg.87 , Pg.88 , Pg.89 ]



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Electron beam lithography resolution

High-resolution lithography, exposure

High-resolution lithography, exposure systems

Lithography high-resolution

Lithography resolution capability

Resolution enhanced lithography

Resolution enhancement of lithography

Resolution enhancement of lithography assisted by chemical shrink

Resolution in optical lithography

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