Lithographic composites

Haley, N. F. Corbiere, S. L. Radiation-Sensitive Composition Containing a Resole Resin and a Novolac Resin and Use Thereof in Lithographic Printing Plates. U.S. Patent 5,372,907, December 13, 1994. 

Research Focus Synthesis of fluorine containing photopolymer positive-resist compositions effective as protective coats in immersion photo-lithographic processes. 

Lithographic Printing Ink.—The composition of lithographic writing ink has boon already given. That which is employed to taka impressions on paper from engraved plates, with a view to their transference to the stona, may be composed as follows -—Tallow, wax, and soap, of each four ounces shellaa, throe ounces gum-mastic, two and a half ounces black pitch, one ounce and a half to which add lamp-black to color. 

The surface characteristics of reworked substrates and several rework processes are described later in several tables and the discussion. The substrate condition following the rework process is characterized by the results of three tests ESCA or XPS [19] surface chemical composition spectra, actual lithographic resist pattern lift testing [2, 6], and water droplet contact angle measurement, 0HjO [3]. 

There are four principal classes of printing ink, which vary considerably in physical appearance, composition, method of application, and drying mechanism. These also fall into two general types of consistency or viscosity, paste and liquid. The classes are letter press and lithographic (litho) inks, which are called paste inks, and flexographic (flexo) and rotogravure (gravure) inks, which are called liquid inks (1). 

Another important future direction is in the use of microelectrodes and microelectrode arrays. They are often easier to manipulate by the inexperienced, and instrumentation is simpler. They can be used in highly resistive dirty media where conventional electrodes may be unuseable and are able to probe localized concentrations. Composite electrodes42, of which carbon paste is an example, if conveniently prepared, can act as microelectrode assemblies. In a more general sense, lithographic and... 

Photoresist compositions consisting of pentafluoromethylvinyl carbonate derivatives, (II), were prepared by Yoon [2] and used in photosensitive polymers for exposure to light sources having a dominant wavelength of less than 157 nm. Perfluorovinyl ether, (III), monomers were prepared by DiPietro [3] and used in lithographic photoresist polymer compositions. 

Deep UV lithographic response curves for the graft copolymers as a function of graft MW at constant composition (25-32%). PMMA developed 45 s in MIBK. 

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