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Lithographic response curves

Figure 6. Lithographic response curve for sample 7Q (e-beam at 20 keV). Initial thickness 3300 A developed 30 s in 1 1 MEK/MIBK A 90 s in 1 3 MEK/MIBK. Figure 6. Lithographic response curve for sample 7Q (e-beam at 20 keV). Initial thickness 3300 A developed 30 s in 1 1 MEK/MIBK A 90 s in 1 3 MEK/MIBK.
Deep UV lithographic response curves for the graft copolymers as a function of graft MW at constant composition (25-32%). PMMA developed 45 s in MIBK. [Pg.134]

Figure 2 Typical lithographic response (contrast) curves for (a) positive and (b) negative resists. Figure 2 Typical lithographic response (contrast) curves for (a) positive and (b) negative resists.
Lithographic Characteristics. The exposure response curves for P(SI-CMS) and Sl-novolac containing PMPS (SI-NPR) are shown in Figure 4, and their lithographic characteristics are summarized in... [Pg.115]

See other pages where Lithographic response curves is mentioned: [Pg.134]    [Pg.39]    [Pg.243]    [Pg.340]    [Pg.517]    [Pg.29]    [Pg.34]    [Pg.41]   
See also in sourсe #XX -- [ Pg.130 , Pg.131 , Pg.134 ]



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