Light-directed chemical synthesis

Micro-arrays can be manufactured in two different ways, by synthesis in situ or by delivery. In the in situ synthesis approach, nucleic acids are synthesized directly on a chip surface. This is made possible by a light-directed chemical synthesis technology developed by scientists at Affymetrix. By using different sets of photolithographic masks, scientitsts can define the chip exposure sites and, thereby, the sequence of the oligonucleotides. In this way, arrays can be synthesized with up to 400,000 different oligonucleotides in an area of 1.6 cm. Every spot contains about... 

Polymeric fullerene materials can be obtained by many methods, for example by irradiation with electrons or ions, treatment in a plasma generator, doping with alkali metals [9,28,46], direct chemical synthesis [47], or mechanical milling [29]. Because of the small penetration depth of light fullerenes can only be photopolymerized as thin films, but bulk photopolymer can be obtained by polymerization in solution [48,49]. Diffraction studies show that photopolymers usually have a disordered fee structure. Although some ordered films have been... 

Fodor, S. P. (1991). Light-directed, spatially addressable parallel chemical synthesis. Science 251, 767-773. 

In-situ photofabrication of OND arrays involves light-directed, spatially addressable, parallel (combinatorial) chemical synthesis [35,43,66-68]. A surface, usually a sihcon wafer or a glass slide, is coated with hnker molecules... 

I-odor. S P A. 01 at. "Light-Directed. Spatially Addressable Parallel Chemical Synthesis.". Vcienee, 767 (February IS. 19911 Jam>ld. M.F. "Nanosurfaee Clietnisiry on Size-Selected Silicon C liniers." Seitner. 1085 tMay 14. 1991). 

Eodor SP, Read JL, Pirrung MC, Stryer L, Lu AT, Solas D. Light-directed spatially addressable parallel chemical synthesis. Science 1991 25 767-773. 

With the same number of chemical steps, the diversity and number of peptides synthesized using light-directed, spatially addressable chemical synthesis depends, among other factors, on the patterns of the photohthographic masks used for each photodeprotection. Different masking strategies can be used. 

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