Junction-point reactive block copolymers

Junction-Point Reactive Block Copolymers for Surface Modification. 183... 

As a consequence of this work, a general strategy for the synthesis of reversibly stimuh-responsive Y-shaped polymer bmshes and their surface attachment has been developed (Fig. 60) [237c]. The preparation of the respective junction-point reactive block copolymers relies on a combination of carbanionic and oxyanionic... 

Fig. 60 Scheme of synthesis of the junction-point reactive block copolymer PS-TEOS-PEO on a silicon wafer. AGE allyl glycidyl ether, TEOS triethoxysilane, TEA triethylamine, K Np potassium naphthalide (see text for details) [237c]... 

Fig. 62 AFM (a) phase and (b) height (total z range 1.7 nm) images of surface covered with surface-confined junction-point reactive block copolymer PS-(TEOS)-PEO...

Extending the concept of confining block copolymers at interfaces, we describe the synthesis and surface properties of a special type of diblock copolymer. These amphiphilic block copolymers are covalently attached to a surface as a consequence of a reactive moiety at the junction point of the two incompatible blocks. This block... 

X-ray reflectivity measurements confirmed that after self-assembly and reaction of the alkoxysilyl group with the silicon oxide a 1-3 nm thick polymer layer had attached to the surface. One important issue was to clarify, whether the junction-point functional polymer was attached to the silicon surface by covalent bonds formed by the TEOS functionality, or by mere noncovalent adsorption of the PS chains at the surface. To shed light on this issue, we carried out additional deposition experiments using the allyl-functional block copolymer PS-(AGE)-PEO instead of the reactive PS-(TEOS)-PEO. X-ray reflectivity results for PS-(TEOS)-... 

Regarding 2D confinement, newly synthesized junction-point block copolymers were chemically anchored onto planar substrates by their reactive junction-point moiety, forming a smooth monomolecular layer. By thermal treatment or exposure... 

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