Interfaces in semiconductors

Another basic approach of CL analysis methods is that of the CL spectroscopy system (having no electron-beam scanning capability), which essentially consists of a high-vacuum chamber with optical ports and a port for an electron gun. Such a system is a relatively simple but powerful tool for the analysis of ion implantation-induced damage, depth distribution of defects, and interfaces in semiconductors. ... 

One of the most important interfaces in semiconductor technology is the Si02/Si interface, whose properties determine the operation of metal-oxide-silicon (MOS) devices. Hydrogen is believed to play an important... 

The surface science of metal oxides has come of age over the past decade, stimulated by a variety of technological challenges. Examples include the needs to understand metal-metal oxide interfaces in semiconductor devices, sensors, and catalysts. Consequently, new techniques for surface analysis and modeling have been exploited to probe the complex surface-adsorbate interactions that govern chemical processes on oxide surface. 

Electrode materials and electrode-oxide interfaces in semiconductor gas sensors... 

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