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Instrument background levels

The systematic errors that contribute to the uncertainties in the data from reactor based instrumentation ( 3.4.2.1) contribute differently to the data from time-of-flight based instruments. Background levels will still vary dependant on the operations of neighbouring spectrometers but since the spectra are accumulated pulse by pulse no particular region of the spectrum is affected by this variation. Spectra are reproducible, within their statistical errors, even when measured years apart. [Pg.108]

These clean rooms tend to be very expensive to build, so if your budget does not stretch to a full-blown clean room, it might be worth investing in special HEPA filter enclosures just for your instrument and sample preparation area. These are typically either mobile units that can be wheeled around the laboratory and placed around different equipment or hood-based enclosures that are placed over a particular instrument. Whatever system is used, their objective is to ensure that the area around the equipment is free of airborne contamination and the instrument background levels are as low as possible. [Pg.146]

The efficiency of particulate removal will depend on the analytical requirements, but for the semiconductor industry it is typical to work in environments that contain 1 or 10 particles (<0.2 pm) per cubic foot of air (class 1 and 10 clean rooms, respectively). These kinds of precautions are absolutely necessary to maintain low instrument background levels for the analysis of semiconductor-related samples, but might not be required for other types of applications. So, even though contamination-free analysis is important, it might be sufficient to work in a class 100,1000, or 10,000 clean room and still meet your cleanliness objectives. ... [Pg.154]

Two types of blanks need to be prepared with each batch of samples. To subtract background levels of contamination occurring during instrumental analysis, an instrument blank, which consists of a matrix-matched solution with no internal standard, is made. Generally, an instrument blank is run at the start of the analysis and will be included in the calibration with assigned concentrations of zero for all elements to be measured, so, in effect, this is subtracted from all the subsequent samples. [Pg.309]

In addition to analysing samples directly on-hne, the instrument can be used for routine tests of samples from other samphng points. These samples are brought to the instrument after collection in suitable gold traps. Care must be exercised in this type of measurement, as with aU others for mercury—the levels of measurement are very low and background levels can distort the result. [Pg.96]

Ra = ka ( Cam + C0), where Cam is the blended impurity concentration of impurity a CQ, the background impurity level and the multiplication constant. Possible sources of background response include instrument noise, sample system outgassing, or interference from other impurity response signals. Proper setup, purging, and operation of the instrument should reduce background levels well below 1 ppb. [Pg.90]

Detection limits for ICP-MS are listed in Table 28-4, where they are compared with those from several other atomic spectrometric methods. Most elements can be detected well below the part-per-billion level. Quadrupole instruments typically allow ppb detection for their entire mass range. High-resolution instruments can routinely achieve sub-part-per-trillion detection limits because the background levels in these instruments are extremely low. [Pg.871]

A critical point in the use of the PAP meter, as an instrument to produce different 2-propanone levels to train a panel to evaluate perceived air quality, is the establishment of the low 2-propanone values, i.e. values below 1 on the scale. A zero level can not be established by the PAP meter as such. The PAP meter without any 2-propanone results in a PAP level of about 0.8. To prevent this deficiency from increasing, it is therefore of utmost importance that the training takes place in a room with a very low background level. [Pg.192]


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See also in sourсe #XX -- [ Pg.146 ]




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