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Hydrogen plasma treatment

It was argued by Saito et al. [509] that a hydrogen plasma treatment as used in the LBL technique causes chemical transport the a-Si H film deposited on the cathode prior to the hydrogen treatment is etched and transferred to the anode. Hence, in the hydrogen plasma silane-related molecules and radicals are present. In fact, material is deposited on the anode under the same conditions as in the case of high dilution of silane with hydrogen. [Pg.152]

Fig. 9.5 SEM images of C3 material before and after hydrogen plasma treatment. For experimental details see [59]. (a) and (b) are top views before and after etching of the C3 material perpendicular to its outer surface, (c) is an in-plane view before etching and (d) represents a view along the long axis of a partly etched fiber. Fig. 9.5 SEM images of C3 material before and after hydrogen plasma treatment. For experimental details see [59]. (a) and (b) are top views before and after etching of the C3 material perpendicular to its outer surface, (c) is an in-plane view before etching and (d) represents a view along the long axis of a partly etched fiber.
G. Zheng et al., Transition of single-walled carbon nanotubes from metallic to semiconducting in field-effect transistors by hydrogen plasma treatment. Nano Lett. 7, 1622 (2007)... [Pg.314]

As mentioned above, the resistivity of our ZnO samples is reduced from 50 to 5 Q cm after hydrogen plasma treatment, which is also in favor of the VznH2 model. Indeed, passivation of Vzn acting as an acceptor in ZnO should increase the -t5 e conductivity of the samples. [Pg.140]

Substrates used included fiber-reinforced epoxy base polymer [FRP], nylon 66, polytetrafluoroethylene [Teflon], poly(ethylene terephthalate) [PET], phenolic resin, and thermoplastic polyimide [ULTEM, GE]. FRPs were the primary substrates used. Initially, they were cleaned with detergent in an ultrasonic bath followed by rinsing with deionized water and alcohol. For further cleaning, they were treated with oxygen plasma (1.33 seem, 60 W, 5 min) followed by a hydrogen plasma treatment (3 seem, 60 W, 5 min). [Pg.451]

To eliminate the possible incorporation of copper oxides into a polymer film, a hydrogen plasma treatment was carried out after the oxygen plasma treatment... [Pg.453]

The micro-Raman spectra of GaAs nanoparticles include a characteristic feature at about 250 cm-1.147 The hydrogen-plasma treatment of GaAs has been probed by Raman spectroscopy. Characteristic bands were seen due to H2 trapped at different types of site.148 DFT calculations gave vibrational wave-numbers for the cluster Ga8As8.149... [Pg.208]

A combination of proton implantation and thermal annealing of CZ or FZ silicon has also been shown to produce shallow donors [85]. Hydrogen can also be introduced in a region near the semiconductor surface by hydrogen plasma treatments as long as the semiconductor surface does not suffer excessive plasma etching. [Pg.30]

The DLTS spectra show that the peak of the Si-defect related level becomes smaller after hydrogen plasma treatment. It suggests that the Si-related defect level is... [Pg.122]

Olander, B. Wirsen, A. Alhertsson, A.-C., Silicone Elastomers with Controlled Surface Composition Using Argon or Hydrogen Plasma Treatment. J. Appl. Polym. Sci. 2003, 90,1378-1383. [Pg.137]

Srivastava, R., Dwivedi, R., Srivastava, S.K (1998b). Effect of oxygen and hydrogen plasma treatment on the room temperature sensitivity of Sn02 gas sensors. Microelectronics Journal, Vol. 29, p>p. 833-838. [Pg.257]

Figure 6 Scanning Force Microscopic (SFM) image of PFS-6-PDMS diblock copolymer cylinders deposited along a prepattemed groove on a resist film, followed by liftoff with acetone followed by hydrogen plasma treatment the aligned nanoscopic line, height 4nm, is composed of clusters of Fe, Si, O, and C (adapted from Ref. 43). Figure 6 Scanning Force Microscopic (SFM) image of PFS-6-PDMS diblock copolymer cylinders deposited along a prepattemed groove on a resist film, followed by liftoff with acetone followed by hydrogen plasma treatment the aligned nanoscopic line, height 4nm, is composed of clusters of Fe, Si, O, and C (adapted from Ref. 43).
Zhi CY, Bai XD, Wang EG, Enhanced field emission from carbon nanotubes by hydrogen plasma treatment. Applies P/tysics Letters, 2002. 81(9) 1690-1692. [Pg.245]


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See also in sourсe #XX -- [ Pg.124 ]




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