Hexafluoroantimonic acid

Hexafluoroantimonic acid [72121 -43-8] HSbF 6H20, is prepared by dissolving freshly prepared hydrous antimony pentoxide ia hydrofluoric acid or adding the stoichiometric amount of 70% HF to SbF. Both of these reactions are exothermic and must be carried out carefully. 

Hexafluoroantimonic acid, 3 65 Hexafluorogallates, 22 357 Hexafluoroisopropyl alcohol (HFIPA), 25 177... 

BROMINATION 2,4-Diamino-l,3-thiazole hydrotribromide. Dibromoisocyanuric acid. Hexafluoroantimonic acid. 

HYDROGENATION, TRANSFER Hexafluoroantimonic acid. Palladium black. Tris-(aquo)hexa-M-acetate-M3 -oxotriruthenium(IlI,IlI,Ill) acetate. Tris(triphenylphos-phine)chlororhodium. Tris(triphenylphosphine)ruthenium(Il) dichloride. HYDROLYSIS, ESTERS Quinoline-Acetic acid. 

As an example, when the photoacid generator triphenylsulfonium hexafluoro-antimonate is exposed to radiation, it decomposes to release the superacid hexafluoroantimonic acid in the resist film. While this photochemical reaction can occur at room temperature, the acid-catalyzed deprotection of the pendant t-butyl group of the resist polymer occurs at reasonable rates only at elevated temperature. It is therefore necessary to heat the resist film to an appropriate temperature (PEB) to provide the energy that is required for the acid-catalyzed deprotection of the t-butyl group of the ester, which in mrn affords the base-soluble norbomene carboxylic acid unit the isobutylene volatilizes. The extent of deprotection at constant temperamre is dependent on the dose of applied radiation. By monitoring the carboxylic acid OH stretch 3000-3600 cm and the ester carbonyl (C O) around 1735 cm acid carbonyl (C O) around 1705 cm , and ester (C-O-C) stretch around 1150 cm it is possible to determine by means of IR spectroscopy the extent of dose-dependent deprotection, as well as the influence of baking temperature on the extent of deprotection for each resist system. Doses ranging from 0 to 50 mJ/cm were applied to each resist system, after which they were baked at 120, 130, 140, and 150°C for 60 seconds and analyzed by FTIR. ... 

When the photoacid generator, triphenylsulfonium hexafluoroantimonate, is exposed to radiation, it decomposes to release the super acid, hexafluoroantimonic acid, in the resist film. While this photochemical reaction can occur at room temperature, the acid-catalyzed deprotection of the pendant r-butyl group of the resist polymer occurs at reasonable rates only at elevated temperature. It is therefore necessary to heat the resist film to an appropriate temperature (postexposure bake) to provide the energy that is required for the acid-catalyzed deprotection of the r-butyl group of the ester, which in turn, affords the base-soluble norbomene carboxylic acid unit isobutylene volatilizes. The extent of deprotection at constant temperature is... 

Hexafluoroantimonic acid forms salts with pentafluoropyridine, tetra-fluoropyrazine, tetrafluoropyridazine, 3,S>dichlorotrifluoropyridine, hepta-fluoroquinoline, and heptafluoroisoquinoline the P n.m.r. spectra of these salts in various solvents have been studied, and the order of basicity of Scheme 53 was deduced. The most important factor which changes the relative order of base strengths from the hydrocarbon to the fluorocaiimn series is the number of fluorine atoms vdiidi flank the ring nitrogen in eadi compound. 

H(SbFg) (called a super acid, hexafluoroantimonic acid) H(BF4) (tetrafluoroboric acid)... 

---