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H-termination

Controlled Hydrolysis of Organohalosilanes in the Presence of End-Stoppers . Preparation of (Si—H) Terminated Oligomers... [Pg.10]

Hydrosilation reactions have been one of the earlier techniques utilized in the preparation of siloxane containing block copolymers 22,23). A major application of this method has been in the synthesis of polysiloxane-poly(alkylene oxide) block copolymers 23), which find extensive applications as emulsifiers and stabilizers, especially in the urethane foam formulations 23-43). These types of reactions are conducted between silane (Si H) terminated siloxane oligomers and olefinically terminated poly-(alkylene oxide) oligomers. Consequently the resulting system contains (Si—C) linkages between different segments. Earlier developments in the field have been reviewed 22, 23,43> Recently hydrosilation reactions have been used effectively by Ringsdorf 255) and Finkelmann 256) for the synthesis of various novel thermoplastic liquid crystalline copolymers where siloxanes have been utilized as flexible spacers. Introduction of flexible siloxanes also improved the processibility of these materials. [Pg.46]

Controlled synthesis of AB, ABA and (AB)n type PEO (A) and PDMS (B) copolymers by hydrosilation of mono- or diallyl-terminated PEO oligomers and telechelic (Si—H) terminated PDMS oligomers were reported by Haesslin 263). Hydrosilation reactions were conducted in bulk, at 90 °C, in the presence of hexachloroplatinic acid catalyst. Completion of the reactions were monitored by H-NMR, GPC and VPO. The molecular weights obtained were in good agreement with theoretical expecta-... [Pg.46]

Liquid crystalline main chain polymers with siloxane spacer groups were obtained by the hydrosilation of (Si—H) terminated polydimethylsiloxane oligomers and mesogenic groups with terminal double bonds as shown in Reaction Scheme XVII-(a). Reactions were usually carried out in THF with the Wacker Oil catalyst 255). Completion of the reactions was followed by the disappearance of the strong (Si—H) absorption band at 2140 cm-1 using IR spectroscopy. [Pg.47]

To date, numerous radical-induced hydrosilylations of terminal olefins or acetylenes have been reported for the H-terminated Si(l 11) surfaces. These reactions are mainly performed by using thermal conditions, UV irradiation, or electrochemistry. More recently, a very mild method was developed for the attachment of high-quality organic monolayers on crystalline silicon surfaces. [Pg.167]

Stage 1 Difunctional monomers A, with functional groups called c, react by an alternating polyaddition reaction with an excess mixture of difunctional D and trifunctional T monomers, which all have the same functional groups, called h (and thus are equally reactive), to (mainly) h-terminated prepolymer PI. In some calculations tetra-functional Q monomers with equally reactive h functional groups were present as well. [Pg.214]

Recently Butler et al. [4] reported the deposition of nanocrystalline diamond films with the conventional deposition conditions for micrometer-size polycrystalline diamond films. The substrate pretreatment by the deposition of a thin H-terminated a-C film, followed by the seeding of nanodiamond powder, increased the nucleation densities to more than 10 /cm on a Si substrate. The resultant films were grown to thicknesses ranging from 100 nm to 5 fim, and the thermal conductivity ranged from 2.5 to 12 W/cm K. [Pg.2]

Figure 5.16 Tapping-mode AFM image of a 25 Cu nanodot array on H-terminated p-Si(l 0 0), formed by nanoindentation. (Reproduced with permission from Ref. [72].)... Figure 5.16 Tapping-mode AFM image of a 25 Cu nanodot array on H-terminated p-Si(l 0 0), formed by nanoindentation. (Reproduced with permission from Ref. [72].)...
Figure 5.17 STM image of H-terminated n-Si(l 1 1) in 0.1 M HCI04 + 1 mM Pb(CI04)2, onto which two Pb clusters have been deposited by a burst-like dissolution of Pb from the STM tip. (Reproduced with permission from Ref. [77].)... Figure 5.17 STM image of H-terminated n-Si(l 1 1) in 0.1 M HCI04 + 1 mM Pb(CI04)2, onto which two Pb clusters have been deposited by a burst-like dissolution of Pb from the STM tip. (Reproduced with permission from Ref. [77].)...
This, together with the Ir-H terminal bond indicates that the compound can be regarded as a further example of the growing number of compounds in which the high oxidation state Ir(v) is stabilized by coordination to a soft polyhedral borane ligand... [Pg.325]

The mechanistic implications of these facile formal cluster oxidations arachno nido closo by nett loss of Hp at moderate temperatures are considerable. The processes are accompanied by, and presumably assisted by a flexibility of coordination geometry about the Ir atom and also by its ready oxidation. The metal atom can be seen as a potential source of electrons for cluster bonding either by involving its lone pairs of electrons or by switching between Ir-H-B bridging and Ir-H terminal bonding... [Pg.329]

Force field calculations248 on H-terminated 30-mer 91 and 104 homologs, plots of which are shown in Figure 38, and also X-ray crystallography on a heptameric poly(diphenylsilylene),252 corroborated the evidence for helicity and suggested /raaswIZ-conformations. [Pg.616]

If we compare the H-bridged A7 directly to the H-terminal A3, we see the expected contraction of the Zr -Zr2 distance due to the bridging Zr -H2-Zr2 bond which will act to hold the Zr metal atoms about 0.30A closer in A7 than in A3. The stronger Zr-Zr interaction would be expected to weaken and lengthen the Zr-N /N2 bonds, but the shorter Zr-Zr distance should also act to squeeze these Zr-N distances to smaller values. The two opposing effects seem to cancel and there are no consistent trends in these Zr-N bond lengths in going from A3 to A7. [Pg.338]

The issue of the chemical nature of graphene edges, and thus of (re)active sites, was addressed head-on by Radovic and Bockrath [29]. Density functional theory was used to minimize problems that truly ab initio approaches such as Hartree-Fock are known to have, but careful comparison with experimental results in several seemingly unrelated fields was also performed. The key argument of relevance here is that, rather than being H-terminated, the sites that are most relevant for the chemical (re)activity of sp2 hybridized carbon materials are of carbene- and carbyne-type, as illustrated below for the zigzag (a) and armchair edges (b). [Pg.507]

It is also possible to produce covalently bonded alkyl MLs on Si(l 11) surfaces using a variety of chemical reactions with passivated H-terminated Si(l 11), but the preparation methods are more complex than the immersion strategy in part due to the higher reactivity of silicon. This is a major achievement because it allows direct coupling between organic and bio-organic materials and silicon-based semiconductors. Both pyrolysis of diacyl peroxides (Linford Chidsey, 1993) and Lewis acid-catalyzed hydrosilylation of alkenes and direct reaction of alkylmagnesium bromide (Boukherroub et al, 1999) on freshly prepared Si(lll)-H produce surfaces with similar characterishcs. These surfaces are chemically stable and can be stored for several weeks without measurable deterioration. Thienyl MLs covalently bonded to Si(l 11) surfaces have also been obtained, in which a Si(l 11)-H surface becomes brominated, Si(lll)-Br, and is further reacted with lithiated thiophenes (He etal, 1998). [Pg.121]

Quantitative measurements of the lower MW band revealed the presence of several Si-Hs in each PDMS chain. Furthermore, the shapes of the DR and IR traces are the same, which indicates that the distribution of hydride groups is proportional to MW and probably random. An example of a non-random distribution would be a PDMS with Si-H terminated chains. With two hydrides per chain, regardless of size, the IR trace of the lower MW portion would be enhanced and the shapes of the two curves would differ markedly. [Pg.171]

Electrodeposition on semiconductor surfaces is useful from the point of view of application in metal/semiconductor-Schottky and ohmic contacts. CycKc voltammetry, current transient methods, STM, and AFM techniques have been used to study Pb electrodeposition on n-Si(lll) surface [311, 313-315]. Lead deposition on the H-terminated Si(lll) is... [Pg.822]

Although Si(100) and Ge(100) undergo similar dimer reconstructions, the Ge(l 11) surface reconstructions differ from those of Si(lll). As described above, Si(lll) reconstructs into a (7 x 7) structure that contains 49 surface atoms in the new unit cell. Ge(lll) is found in various reconstructed forms depending on surface preparation, but the most common reconstruction under vacuum is Ge(lll)-c(2 x 8) [51-53]. This structure involves charge transfer from adatoms to restatoms [5]. On the other hand, most of the passivation and functionalization studies reviewed here lead to the Ge(lll)-1 x 1 surface structure. This structure, in which the surface Ge atoms retain their bulk positions, can be achieved by hydrogen, chlorine, or alkyl termination of the surface (discussed below). The structure is analogous to that for H-terminated Si(lll). [Pg.331]

A recent theoretical study by Takeuchi et al. [140] has examined the mechanism for the reaction of both alkenes and alkynes with the H-terminated silicon surface using periodic DFT calculations, and the results are in good agreement with the proposed radical-based mechanism [137]. In particular, the calculations show that the reaction occurs through a carbon-based radical intermediate which must be sufficiently stabilized to proceed by abstraction of a surface hydrogen (as in the case of styrene) if the intermediate is not stable enough, it will preferentially desorb (as in the case of ethylene). The calculations also show that reaction with terminal alkynes should proceed faster and lead to more stable products than with terminal alkenes [140]. [Pg.341]


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See also in sourсe #XX -- [ Pg.245 ]




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H-termination, silicon

Hole conduction at H-terminated surface

Stability of H-Terminated SiNW Surfaces

Terminal M—H Bonds

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