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Film thickness substrate surface

In block copolymer thin films, the perpendicular orientation of microdomains relative to the substrate cannot be achieved by the shear methods developed in the bulk case. Based on the additional variables (film thickness and surface/interface interactions) in block copolymer thin films, as described in Sect. 2.1.2, three different strategies are generally applied for orienting block copolymer thin films ... [Pg.200]

Most of the current theoretical research of symmetric boundary conditions has been done on lamellar diblock films. Various techniques have been used to determine the influence of film thickness on morphology. Turner used a scaling analysis to study symmetric versus antisymmetric lamellae as a function of film thickness and surface potential (Turner, 1992). Walton and coworkers used this same scaling analysis to study vertically oriented lamellae relative to the substrate (Walton et al, 1994). It was found that this arrangement relaxes the entropic penalty imposed on the chains. Comparing the surface and interfacial energies associated with lamellar orientation, it was determined that domain orientation is film-thickness dependent and for neutral surface energies vertical-oriented lamellae are stable for all film thicknesses (Walton et al, 1994). [Pg.771]

There are many direct and indirect techniques for measuring the thickness of a deposited thin Im [32,33] general problem in measuring film thickness is the definition of the surface , since surfaces generally have peaks and valleys. Since films have a low thickness, substrate surface roughness may play a major role in thickness measurement. Film and coating thickness may be defined in three ways ... [Pg.411]

The physical techniques used in IC analysis all employ some type of primary analytical beam to irradiate a substrate and interact with the substrate s physical or chemical properties, producing a secondary effect that is measured and interpreted. The three most commonly used analytical beams are electron, ion, and photon x-ray beams. Each combination of primary irradiation and secondary effect defines a specific analytical technique. The IC substrate properties that are most frequendy analyzed include size, elemental and compositional identification, topology, morphology, lateral and depth resolution of surface features or implantation profiles, and film thickness and conformance. A summary of commonly used analytical techniques for VLSI technology can be found in Table 3. [Pg.355]

Cobalt—chromium films (20 at. % Cr) exhibiting strong perpendicular anisotropy, ie, hexagonal i -axis normal to the substrate surface, have been studied (53). Fifty nanometer films are composed of columnar crystaUites and the domain size was found to be a few stmctural columns in diameter. Magnetization reversal was shown to occur by domain rotation in thick films. Thinner (ca 10-nm thick) films do not show the columnar crystaUite... [Pg.393]

The molecular dipstick microscope is related to the AFM. It measures lubricant film thickness. The probe is lowered into the oil film on a surface (like the automobile engine crankcase dipstick). The tip is attracted to the surface by the surface tension of the film but repelled by van der Waal s forces from the hard substrate. By noting the height of the probe from the two surfaces as it makes contact, the film thickness can be measured with a precision of about 0.5 nm. [Pg.333]

Other small molecule species decompose and volatilise. The glass frit fuses, wetting the surface of the functional phase, providing adhesion and sealing of the composite to the substrate. Because of the screen printing process, resolution is modest. Fired film thicknesses, which range from 10 to 50 p.m (0.4 to 2.0 mils), are large compared to thin-fHm microelectronics. Some photosensitive pastes are also ia use. [Pg.126]

Ellipsometry is a method of measuring the film thickness, refractive index, and extinction coefficient of single films, layer stacks, and substrate materials with very high sensitivity. Rough surfaces, interfaces, material gradients and mixtures of different materials can be analyzed. [Pg.265]

Tsai then applied thick films of the polyamic acid of PMDA and 4-BDAF to polished silver substrates and thermally imidized the films. The substrates were immersed into liquid nitrogen, causing the films to delaminate and XPS was used to examine the polyimide and silver fracture surfaces (see Fig. 33). The C(ls) spectra of the silver fracture surface were very similar to those of neat polyamic acid, indicating that imidization was inhibited by interaction of the polyamic acid with the silver substrate. This was evident from the observation of two peaks near... [Pg.283]

Numerical solution of Eq. (51) was carried out for a nonlocal effective Hamiltonian as well as for the approximated local Hamiltonian obtained by applying a gradient expansion. It was demonstrated that the nonlocal effective Hamiltonian represents quite well the lateral variation of the film density distribution. The results obtained showed also that the film behavior on the inhomogeneous substrate depends crucially on the temperature regime. Note that the film exhibits different wetting temperatures on both parts of the surface. For chemical potential below the bulk coexistence value the film thickness on both parts of the surface tends to appropriate assymptotic values at x cx) and obeys the power law x. Such a behavior of the film thickness is a consequence of van der Waals tails. The above result is valid when both parts of the surface exhibit either continuous (critical) or first-order wetting. [Pg.282]


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Substrate surface

Surface films

Thick films

Thick-film substrates

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