Film/coating properties diffusion barrier

Thin films with a broad spectrum of properties can be deposited in plasma chemical processes [30, 31]. Hard coatings such as diamond films and TiN films, soft plasma polymer films, insulating SiO films, highly conducting Si films, anti-reflection coatings, semi-permeable membranes and very effective diffusion barriers can be deposited. Important parameters for the film deposition are (i) the nature of the precursor, (ii) the gas mixture and... 

EGDA is a cross-linker that has been employed repeatedly in iCVD polymerization to enhance the mechanical properties of the film [67,68]. p(PFDA-co-EGDA) was deposited in channels of poly(dimethylsiloxane) (PDMS) microfluidic devices as a barrier coating to prevent diffusion and swelling [50] or to provide an adequate interface for the synthesis of nanoparticles in droplet-flow microfluidic reactors [52]. p(PFDA-co-EGDA) was used to robustly encapsulate IL marbles [51]. IL marbles were fabricated rolling off a droplet of IL in a Petri dish with FI FE microparticles. Next, the Petri dish was placed inside the vacuum chamber and the marbles were conformally coated over the entire surface. 

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