Etching definition

A graduated flask (known alternatively as a volumetric flask or a measuring flask), is a flat-bottomed, pear-shaped vessel with a long narrow neck. A thin line etched around the neck indicates the volume that it holds at a certain definite temperature, usually 20 °C (both the capacity and temperature are clearly marked on the flask) the flask is then said to be graduated to contain. Flasks with one mark are always taken to contain the volume specified. A flask may also be marked to deliver a specified volume of liquid under certain definite conditions these are, however, not suitable for exact work and are not widely used. Vessels intended to contain definite volumes of liquid are marked C or TC or In, while those intended to deliver definite volumes are marked D or TD or Ex. 

The fabrication method generates functional elements via anisotropic etching of high-quality semiconductor wafers, referred to as mother wafers.13 17 25 The process begins with photolithographic definition of patterns... 

Catalytic etching, 41 359, 383-384 definition, 41 360-361 in low earth orbit, 41 414—415 models, 41 359, 360-362 plasma etching, 41 407-414 thermally generated free radicals, 41 406-407... 

The second definition of the purpose of a carrier was to remove the overburden of material above a surface above the device plane. For present purposes, we define the device level as the boundary between the material one wishes to remove and the material one wants to keep. It is not necessarily planar, and it moves up with each layer. For oxide CMP, this layer lies within the topmost film layer. For metal CMP, this surface is defined by the topmost surface of the dielectric into which lines and vias are etched for a damascene process. This definition must accommodate a wafer with a modest amount of bow, tilt, warp, and total thickness variation. Furthermore, it must accommodate very modest amounts of bow, warp, tilt. 

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