Etching anisotropic photo

Our thanks also go to Dr. B. Wagner and I. Lisec of the Fraunhofer Institute fur Silizium-technologie for the fabrication of multi-layer structures by photo- and e-beam-lithography and for the anisotropic etching of silicon membranes. 

Detector elements 11 are formed on a ceramic substrate 1. Each detector element includes a photosensitive zone 9, an output terminal 4 and a common terminal S. The detector elements are arranged in an array protruding from a common metal line 3, which is connected to a terminal pad 6. The terminal electrodes and the common metal line are formed on a comb-like patterned photo-conductive layer 2. An aperture plate 7 of silicon or ZnS having apertures 8 formed therein by an anisotropic etching method is prepared. The purpose of the aperture plate is to restrict the field of view of the photosensitive zones. An auxiliary electrode 30 is formed on the aperture plate. When the aperture plate is assembled with the substrate using an adhesive, the auxiliary electrode is pressed against the common metal line and the common terminal, which together reduce the electrical resistance. 

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