Electron cyclotron resonance chemical vapor

Q.F. Huang, S.F. Yoon, Rush, Q. Zhang and J. Ahn, Dielectric Properties of Molybdenum-containing Diamond-like Carbon Films Deposited Using Electron Cyclotron Resonance Chemical Vapor Deposition, Thin Solid Films, 409, 211-219 (2002). [Pg.484]

Characteristics of Tin Oxide Thin Films on a Poly Ethylene Terephthalate Substrate Prepared by Electron Cyclotron Resonance-Metal Organic Chemical Vapor Deposition... [Pg.385]

C. R. Eddy, Jr., D. L. Youchison, and B. D. Sartwell, Comparison of (CH4-02)-H2 and CO-H2 plasmas for low temperature diamond film deposition by electron cyclotron resonance plasma-assisted chemical vapor deposition. Diamond Relal Mjter., 3(1-2) 105-1H (1994)... [Pg.167]

M. Komori, T. Maid, T. Kim, G. Hou, Y. Sakaguchi, K. Sakuta, and T. Kobayashi, Homoepitaxial growth of diamond thin films by electron cyclotron-resonance microwave plasma chemical-vapor-deposition apparatus with CO/H gaseous source, Appl. Phys. Lett., 62(6) 582-584 (1993)... [Pg.168]

Another way of plasmachemical preparation involves the use of electron cyclotron resonance for plasma assisted chemical vapor deposition (ER-CVD) [7]. An alternative method to prepare undoped microcrystalline (pc) SiC H alloy films is developed recently as so-called hot wire chemical vapor deposition (HWCVD) technique [8]. [Pg.64]