Critical dimension uniformity

In the CD uniformity metric, the variation of feature CD is experimentally determined from measurement, and relevant population statistics are applied to characterize it in terms of range and standard deviation. Good image quality is associated with tight CD uniformity. 

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With these emerging applications, there is a critical need for analytical techniques that will provide insights to fundamental questions concerning dendrimer characteristics and properties (e.g. their dimensions, uniformity of size, shape and degree of rigidity, etc.) [8-10], atomic force microscopy (AFM) offers this... 

Poly(l-butene sulfone) resist has been widely used in photomask manufacture since the 1970s and 1980s because it affords resolution down to about 500 nm (on the mask). It is marketed under the commercial name PBS and was extremely successful during this time. However, the performance of the resist in terms of etch resistance, resolution, and critical dimension linearity and uniformity was found to be inadequate as the industry migrated to much smaller critical dimensions that required dry etch processing of the photomask Cr. ... 

Limits will be provided for both dry aind water-moderated systems. A completely dry oxide system inay be difficult to guarantee hence, limits will also be provided for damp [H/(U + Pu) <0.45] oxide. Solutions and slurries are assumed to be uniform, homogeneous mixtures of UO, (10.96 g/cm ) and PuOb (11.46 g/cm for PuQ ) in water. Critical dimensions of such systems have minima as a function of concentration, provided the oxide mixture does not contain much more than 30% PuO by weight. 

The three-dimensional displacements inherent to NIL require resist materials that easily deform under an applied pressure and/or elevated temperature. These resists must have a low viscosity during imprinting, a Young s modulus less than that of the mold, and a low sheer modulus. It should also be mentioned that the resist material should have excellent adhesion to the substrate, provide high-quality, uniform film thickness through deposition via spin-coating, and have sufficient thermal and mechanical properties for subsequent processes. When determining the type of NIL resist to use, one should consider the critical dimensions of the pattern, pattern density, release properties from the mold, required imprint temperature and pressure, etch selectivity for subsequent pattern transfer, and route to eventual removal by dissolution or other processes. 

For any battery applications, the separator should have uniform pore distribution to avoid performance losses arising from nonuniform current densities. The submicrometer pore dimensions are critical for preventing internal shorts between the anode and the cathode of the lithium-ion cell, particularly since these separators tend to be as thin as 25 /[Pg.192]

The carrier position in the directly detected dimension may seem to be important however, in most cases it is not critical whatsoever. The one exception is when no quadrature detection in the remote dimension is desired (see below). In a general scenario the carrier can be placed anywhere in the spectral region of interest with no significant penalty on overall acquisition time. The only important requirement to be fulfilled is that the pulse(s) should cover the desired frequency range with sufficient uniformity (see also below). 

Rudin combined Flory s theory of the dimension of polymer coils with Zimm s expression (Zimm, 1946) for the second virial coefficient in a dilute suspension of uniform spheres. He further assumed that the swelling factor (e) of the polymer coil (identical to a3 in Flory s formalism) reduces to 1 at a certain critical concentration cx, Ewhereas it tends to a value e0 (= [//] (/[//]w ) at infinite dilution. The functional relation between e and c, would therefore be... 

One should be careful in applying the foregoing considerations to electrodes of widely different dimensions. For example, if one were to employ the RDE in an industrial cell using, say, an electrode area of 1000 cm, the critical Reynolds number would be reached at the rim of the electrode at a rotation rate of only 30 rpm, and turbulence may have occurred at even lower rotation rates, as pointed out earlier. Such electrodes may still be of practical value in an industrial process, as long as one is aware that mass transport may become turbulent beyond a certain radius and that it will not necessarily be uniform on all parts of the electrode. 

The key structural feature of the molecular sieves is the narrow, uniform, continuous channel system that becomes available after the zeolitic water has been driven off by heating and evacuation. Great thermal stability after dehydration has been observed in the rigid lattices of X- and Y-type faujasites, zeolite A, mordenite, and chabazite. The geometry of the internal channel and cavity system is characteristic of the individual zeolite. Entrance to the intracrystalline volume is through orifices (ranging from 3 to 9 A in the various zeolites) located periodically throughout the structure. It is thus apparent that access to the intrazeolitic environment is limited to molecules whose dimensions are less than a certain critical size. 

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