Circuits future advances

Advanced materials are of paramount importance for the future of the electronics industry. Remarkable progress has been made in fitting increasingly greater numbers of components into an integrated circuit. This is illustrated by the often-shown electronic device density versus time semilogarithmic plot (Fig. 3) [30], as well as by the notebook computer, alluded to earlier. The... 

L. Brissonneau, C. Vahlas, and A. Reynes, Processing of Pure Ni MOCVD Films, Presented at Advanced Interconects and Contact Materials and Processes for Future Integrated Circuits Symposium, Proceedings of Material Research Society Symposium, Vol.514, 1998, pp.491-496. 

As mentioned in Chapter 1, the present state of CMP is the result of the semiconductor industry s needs to fabricate multilevel interconnections for increasingly complex, dense, and miniaturized devices and circuits. This need is related to improving the performance while adding more devices, functions, etc. to a circuit and chip. This chapter, therefore, discusses the impact of advanced metallization schemes on the performance and cost issues of the ICs. Our discussions start with the impact of reducing feature sizes on performance and the need of various schemes to counter the adverse effect of device shrinkage on the performance of interconnections. An impact of continued device shrinkage on circuit delay is discussed. Then the need of low resistivity metal, low dielectric constant ILD, and planarized surfaces is established leading to the discussion of CMP. Finally various planarization techniques are compared to show why CMP is the process that will satisfy the planarity requirements of the future. 

Ordered polymer films made from poly benzthiazole (PBZT) and poly benzoxazole (PBO) can be used as substrates for multilayer printed circuit boards and advanced interconnects to fill the current need for high speed, high density packaging. Foster-Miller, Inc. has made thin substrates (0.002 in.) using biaxially oriented liquid crystal polymer films processed from nematic solutions. PBZT films were processed and laminated to make a substrate with dielectric constant of 2.8 at 1 MHz, and a controllable CTE of 3 to 7 ppm/°C. The films were evaluated for use in multilayer boards (MLBs) which require thin interconnect substrates with uniform controllable coefficient of thermal expansion (CTE), excellent dielectric properties, low moisture absorption, high temperature capability, and simple reliable processing methods. We found that ordered polymer films surpass the limitations of fiber reinforced resins and meet the requirements of future chip-to-chip interconnection. 

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