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Chemically assisted ion-beam etching CAIBE

A technique that combines both physical and chemical etching mechanisms is chemically assisted ion beam etching (CAIBE). In CAIBE, an inert gas ion beam is directed at a sample which is situated in a... [Pg.477]

Figure C2.18.2. Schematic representations of various experimental configurations for plasma etching, (a) Reactive ion etching (RIE). (b) Electron cyclotron resonance etching (ECR). (c) Chemically assisted ion beam etching (CAIBE). The configurations are described in the text. Figure C2.18.2. Schematic representations of various experimental configurations for plasma etching, (a) Reactive ion etching (RIE). (b) Electron cyclotron resonance etching (ECR). (c) Chemically assisted ion beam etching (CAIBE). The configurations are described in the text.
RIE MERIE ICP RIBE ECR CAIBE Reactive ion etching Magnetically enhanced reactive ion etching Inductively coupled plasma Reactive ion beam etching Electron cyclotron resonance Chemically assisted ion beam etching Chemical-physical Chemical-physical Chemical-physical Chemical-physical Chemical-physical Chemical-physical... [Pg.67]

Chemically assisted reactive ion beam etching (CAIBE)... [Pg.309]


See other pages where Chemically assisted ion-beam etching CAIBE is mentioned: [Pg.381]    [Pg.167]    [Pg.381]    [Pg.394]    [Pg.473]    [Pg.475]    [Pg.487]    [Pg.628]    [Pg.2927]    [Pg.878]    [Pg.381]    [Pg.167]    [Pg.381]    [Pg.394]    [Pg.473]    [Pg.475]    [Pg.487]    [Pg.628]    [Pg.2927]    [Pg.878]   
See also in sourсe #XX -- [ Pg.394 ]




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