Chemically amplified negative resists based on acid-catalyzed intramolecular dehydration

2 Chemically amplified negative resists based on acid-catalyzed intramolecular dehydration 

Chemical amplification resists for microlithography, Adv. Polym. Set, 172, 149 (2005). Ito, Y. Maekawa, R. Sooriyakumaran, and E.A. Mash, Acid catalyzed dehydration A new mechanism for chemically amplified lithographic imaging, Polymers for Microelectronics, ACS Symp. Series 537, L.F. Thompson, C.G. Willson, and S. Tagawa, Eds., p. 64, American Chemical Society, Washington, DC. (1994). 

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