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Chemically amplified methacrylate negative resists based on acid-catalyzed esterification

4 Chemically amplified methacrylate negative resists based on acid-catalyzed esterification [Pg.246]

Yokoyama, T. Hattori, K. Kimura, T. Tanaka, and H. Shiraishi, Effect of comonomer structure on dissolution characteristics, J. Photopolym. Sci. Technol. 13, 579 (2000) 14, 393 (2001). [Pg.247]

Sundarajan, S. Yang, K. Ogino, S. Valiyaveetil, J. Wang, X. Zhou, C.K. Ober, S.K. Obendorf, and R.D. Allen, Supercritical CO2 processing for submicron imaging of fluoropolymers, Chem. Mater. 12, 41 (2000). [Pg.250]

Havard, N. Vladimirov, J.M.J. Frechet, S. Yamada, G. WiUson, and J.D. Byers, Photoresists with reduced environmental impact Water soluble resists based on pboto cross linking of a sugar containing polymetbacrylate, Macromolecules 32, 86 (1999). [Pg.250]




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Acid amplifier

Acid resistance

Acid-catalyzed esterification

Acidizing chemicals

Acids acid-catalyzed esterification

Acids chemical resistance

Acids esterification

Acids methacrylic acid

Amplifiers

Base Resistance

Base-catalyzed esterification

Chemic acid

Chemical amplifier

Chemical negative

Chemical resistance

Chemically amplified negative resists

Chemically amplified resist

Chemically amplified resists

Methacrylic acid

Methacrylic acid methacrylate

Negative resist

Negative resistance

Negative resists

Negative resists resist

Resist -based

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