Chemical vapor deposition phosphides

The cleavage of a P-Ph bond (method (1)) has been widely used to create a variety of phospholide salts. Notably, this methodology has been employed in the synthesis of group 13 phospholyl complexes, which have come to the fore in recent years as potential single source substrates for the preparation of the corresponding metal phosphides by chemical vapor deposition (CVD). This is exemplified by the reaction of lithium 2,5-di(tert-butyl)phospholide with GaBr to afford a Ga(l) polymer 297 (Scheme 101) <1999AGE1646>. Additionally, this synthesis nicely illustrates the use of bulky substituents in the position a to phosphorus to favor -coordination. 

K. Sugiyama, Chemical Vapor Deposition of Nickel Phosphide Ni P, Journal of Less-Common Metals, Vol.64,1979, pp. 101-106. 

In the fifteen years since publication of the first edition of Comprehensive Coordination Chemistry (CCC, 1987), group 5 chemistry has been part of the intensive development of ceramic, optical, and magnetic materials based upon metal borides, nitrides, phosphides, oxides, and sulfides. A major impetus came from the discovery of the high-temperature superconducting oxides. In addition, the search for new routes to these materials via sol-gel or chemical vapor deposition techniques has spurred growth in metal amido, oxo, alkoxo, thio, and carboxylato chemistry. 

The preparation of tin phosphides has received attention due to their interesting mechanical, optical, and electrical properties catalyst applications. Atmospheric pressure chemical vapor deposition (APCVD) of tin phosphide thin films was achieved on glass substrates from the reaction of SnCU or SnBr4 with (R = Cy or Ph) at 500-600 °C. The films showed good uniformity and surface... 

E Schroten, A Goossens, J Schoonman. Synthesis of nanometer-scale boron phosphide whiskers by vapor-liquid-soUd chemical vapor deposition, J Appl Phys 79 4465, 1996. 

Blackman CS, Carmalt CJ, O Neill SA, Parkin IP, Apostolico L, Molloy KC (2004) Atmospheric-pressure chemical vapor deposition of group IVb metal phosphide thin films from tetrakisdimethylamidometal complexes and cyclohexylphosphine. Chem Mater 16 1120-1125... 

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