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Channels manifold/substrate

While the manifolds were fabricated by a plain molding process, the microchannels substrate fabrication was quite complicated and was achieved by a multistage process. The following main stages were used in the process (1) double side oxidation of a 525 pm (1 0 0) silicon substrate to 1,000 A, (2) single side 1,200 A silicon nitride deposition, (3) silicon nitride channels template opening by reactive... [Pg.394]

Once the micro-channels were fabricated, the manifold were bonded to the substrate by epoxy glue, and the resistor was wired by a silver-based epoxy electric conductor and painted with a 1 pm thin paint to increase the surface emissivity. The triangular micro-channels and the unpainted resistor are shown in Fig. 9.12. [Pg.395]

Fig. 10.8 Examples of substrate and manifold channels, flow components, and surface mount components fortheSwagelok MPC NeSSI system. Fig. 10.8 Examples of substrate and manifold channels, flow components, and surface mount components fortheSwagelok MPC NeSSI system.

See other pages where Channels manifold/substrate is mentioned: [Pg.394]    [Pg.326]    [Pg.2666]    [Pg.1605]    [Pg.81]    [Pg.176]    [Pg.186]    [Pg.397]    [Pg.22]    [Pg.371]    [Pg.285]    [Pg.326]    [Pg.327]    [Pg.329]    [Pg.526]    [Pg.53]    [Pg.217]    [Pg.124]    [Pg.346]    [Pg.213]    [Pg.328]    [Pg.140]   
See also in sourсe #XX -- [ Pg.330 ]




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