Ceramics coatings/thin film processing

Solution Deposition of Thin Films. Chemical methods of preparation may also be used for the fabrication of ceramic thin films (qv). MetaHo-organic precursors, notably metal alkoxides (see Alkoxides, metal) and metal carboxylates, are most frequently used for film preparation by sol-gel or metallo-organic decomposition (MOD) solution deposition processes (see Sol-GEL technology). These methods involve dissolution of the precursors in a mutual solvent control of solution characteristics such as viscosity and concentration, film deposition by spin-casting or dip-coating, and heat treatment to remove volatile organic species and induce crystaHhation of the as-deposited amorphous film into the desired stmcture. 

The sol-gel process involves the transition of a system from a liquid "sol" (mostly colloidal) into a solid "gel" phase (11). By applying this methodology, it is possible to fabricate ceramic or glass materials in a wide variety of forms ultrafine or spherical-shaped powders, thin film coatings, ceramic fibers, microporous inorganic membranes, monolithic ceramics and glasses, or extremely porous aerogel materials. 

From the above mentioned silica preparation paths, the sol-gel route is the most studied and consequently most documented. Sol-gel processing is used not only for the preparation of silica gels, but also for the synthesis of ceramic products, ranging from thin films and coatings over porous membranes to composite bodies.4... 

It is evident that the ceramic membrane, which is represented in the XRD pattern (see Figure 10.6) by the amorphous component of the XRD profile, was covered by the AlP04-5 molecular sieve, since the crystalline component of the obtained XRD pattern fairly well coincides with the standards reported in the literature [107]. Consequently, the porous support was successfully coated with a zeolite layer, which was shaped by the hydrothermal process as previously described. Thus, a composite membrane, that is, an AlP04-5 molecular sieve thin film zeolite-based ceramic, was produced. 

Because the ion-assisted processes enable deposition at temperatures less than 100°C, deposition of diamond like coatings has been attempted on a wide range of substrates, e.g., stainless steel, Copper, ceramics,optical materials (plastics, polymers and polycarbonates),glasses,quartz, sapphire,infrared-transmitting optical materials such as germanium, zinc sulfide and zinc selenide, and a variety of electronic grade materials. Although thin films can be produced... 

Coating and thin films can be applied by a number of methods. In thermal or plasma spraying, a ceramic feedstock, either a powder or a rod, is fed to a gun from which it is sprayed onto a substrate. For the process of physical vapor deposition (PVD), which is conducted inside an enclosed chamber, a condensed phase is introduced into the gas phase by either evaporation or by sputtering. It then deposits by condensation or reaction onto a substrate. A plasma environment is sometimes used in conjunction with PVD to accelerate the deposition process or to improve the properties of the film. For coatings or films made by chemical vapor deposition (CVD), gas phase chemicals in an appropriate ratio inside a chamber are exposed to a solid surface at high temperature when the gaseous species strike the hot surface, they react to form the desired ceramic material. CVD-type reactions are also used to infiltrate porous substrates [chemical vapor infiltration (CVI)]. For some applications, the CVD reactions take place in a plasma environment to improve the deposition rate or the film properties. 

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