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Auger spectrum after electrodeposition

Figure 6. Auger spectrum after electrodeposition of Cu on Ru(0001) from an electrolyte of 0.2 M HC104 and 0.96 mM Cu2+. The sample was emersed without rinsing at 40 mV (SCE). (Data from ref. 16.)... Figure 6. Auger spectrum after electrodeposition of Cu on Ru(0001) from an electrolyte of 0.2 M HC104 and 0.96 mM Cu2+. The sample was emersed without rinsing at 40 mV (SCE). (Data from ref. 16.)...
For a compound semiconductor to be useful as a substrate in studies of electrodeposition, it is desirable that clean, unreconstructed, stoichiometric surfaces be formed in solution prior to electrodeposition. For CdTe, the logical starting point is the standard wet chemical etch used in industry, a 1-5% Brj methanol solution. A CdTe(lll) crystal prepared in this way was transferred directly into the UHV-EC instrument (Fig. 39) and examined [391]. Figure 66B is an Auger spectrum of the CdTe surface after a 3-minute etch in a 1% Br2 methanol solution. Transitions for Cd and Te are clearly visible at 380 and 480 eV, respectively, as well as a small feature due to Br at 100 eV. No FEED pattern was visible, however. As described previously, a layer of solution is generally withdrawn with the crystal as it is dragged (emersed) from solution (the emersion layer). After all the solvent has evaporated, the surface is left with a coating composed of the... [Pg.182]


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