Silicon halides arsenides

The oxides, hydrides, halides, sulphides, sulphate , carbonates, nitrates, and phosphates are considered with the basic elements the other compounds are taken in connection with the aoidio element. The double or complex salts in connection with a given element include those associated with elements previously discussed. The carbides, silicides, titanides, phosphides, arsenides, etc., are considered in connection with carbon, silicon, titanium, etc. The intermetallic compounds of a given element include those associated with elements previously considered. 

While group III-V (e.g., gallium phosphide and gallium arsenide) and group II-VI (e.g., mercury cadmium tellurium) semiconductor devices are far less common than silicon semiconductors, CVD operations for them have certain chemistries unique in semiconductor manufacturing.[4 l-[43] Halide CVD processes used in the manufacture of some III-V devices utilize arsenic trichloride and phosphoms trichloride as source chemicals.[ 2][ l... 

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