VLSI electronics

N. G. Einspmch, ed., VLSI Electronics Microstructure Science, Vol. 8 Plasma Processingfor VLSI, Aca demic Press, Inc., Orlando, Fla., 1984. 

In the foregoing the potential of integrated optical devices for sensing has been demonstrated and a view of present and future research has been given. A comparison with VLSI electronics has been made, but one has to bear in mind that optical circuitries have a delay of more than 30 years with respect to electronic ICs. 

R.J. Matyi, in Heterostructures and Quantum Devices (VLSI Electronics Microstructure Science), W.R. Frensley, N.G. Einspruch (eds.), Academic Press, San Diego, 1994, Ch. 2. 

King, M. C. "Principles of Optical Lithography" in VLSI Electronics Microstructure Science, 1981, 7, ed. by Einspruch, N. G., Academic Press, New York, N.Y., p 41-81. 

Howard, R. E. Prober, D. E., "Nanometer-Scale Fabrication Techniques" in "VLSI Electronics-Microstructure Science", Vol. 5, Ein-spruch, N. G., ed., 1982. 

M. King, in N. Einspmch, eds., VLSI Electronics Microstructure Science, Vol. 1, Academic Press, New York, 1981, Chapt. 2. 

Einspruch, N. G. Brown, D. A., Eds., VLSI Electronics Microstructure Science , vol. 8, "Plasma Processing for VLSI , Academic New York, 1984. 

J. Bloem and J. Giling, VLSI Electronics Microstructure Science, Academic Press, Honda, Vol. 12, 1985, p.91. 

Einspruch, N.G., Gildenblat, G.S. VLSI Electronics Micro structure Science, Advanced MOS Device Physics, vol. 18. Academic, California (1989)... 

D. L. Smith in VLSI Electronics Microstructure Science, Vol. 8, Plasma Processing for VLSI, N. G. Einspruch and D. M. Brown, (eds.) Academic Press, San Diego, CA (1984). 

C.A. Mack, A. Stephanakis, and R. Herschel, Lumped parameter model of the photolithographic process, in Kodak Microelectronics Seminar Proc., pp. 228 238 (1986), R. Herschel and C.A. Mack, Lumped parameter model for optical lithography, in Lithography for VLSI, VLSI Electronics Microstructure Science, R.K. Watts and N.G. Einspruch, Eds., pp. 19 55, Academic Press, New York (1987) C.A. Mack, Enhanced lumped parameter model for photolithography, Proc. SPIE 2197, 501 510 (1994). 

M. A. Nicolet, S. S. Lau, Formation and Characterization of Transition Metal suicides, in VLSI Electronics Vol. 6 (Ed. N. G. Einspruch), Academic Press, New York, 1983. 

VLSI Electronic Micro structure Science, ed. by N.G.Einspruch, D.M.Brown... 

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