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Vacancy mechanism assumption

Both mechanisms explain the decrease of the resistance with the formation of a rooted or an isolated hydroxyl group out of an O2" of the lattice. In both cases it is assumed that the bonding to the Sn does not contribute to the concentration of free charge carriers, which implies that not all the surface tin atoms are in oxidation state +4 because otherwise the formation of the Sn—OH bond would need an electron from the conduction band. This assumption is reasonable because tin has two stable oxidation states, +2 and +4, and the most stable surface of tin dioxide, (110), can easily be conditioned to show atoms with both oxidation states. Furthermore it is known that defects like vacancies are an essential factor for the performance of Sn02 gas sensors and it probably is not realistic to base a mechanism on the situation on a perfect surface. Emiroglu et al. (2001) and Harbeck et al. (2003) proved the formation of rooted and isolated hydroxyl group on the Sn02 surface in the presence of water, so the final result is clear even if the exact mechanism still allows for speculation. [Pg.84]

Oxygen transport in the perovskites is generally considered to occur via a vacancy transport mechanism. On the assumption that the oxygen vacancies are fully ionized and all contribute to transport, i.e., oxygen defects are not associated, the Nernst-Einstein equation reads,... [Pg.490]

According to this mechanism, the reaction of CO with the lattice oxygen (Oq) creates oxygen vacancies (Vq) in the solid. Ce4+ is reduced to Ce3+ leading to n-type semiconductivity. In their elegant work, Breysse et al. (1972) showed that if the second step is rate determining, then, upon assumption of the steady-state hypothesis for the oxygen vacancies (Vq), the electrical conductivity should be proportional toPq°25- They found experimentally that cr oc / q° 50 0 03. [Pg.204]

The implication is that it is possible to determine the diffusion coefficient from the easier measurement of ionic conductivity. However, the assumption that both processes utilise exactly the same mechanism is important In general, this is not true. In such a case, the relationship is slightly different from that in Equations (7.15) and (7.16) and depends on the details of the diffusion mechanism. For vacancy diffusion in a cubic structure. [Pg.217]

Electrical properties of thin rare earth oxide film have also been studied. The conductivity of praseodymium thin film oxide was measured as a function of temperature and oxygen pressure [9]. The oxide film was found to act as a p-type conduction at temperatures high than 630°C and was a n-type semiconductor at the temperatures of 400-630°C. Thermally evaporated EU2O3 thin film on a glass substrate is also obtained in an amorphous state. From the measurement of frequency dependence of the ac conductance, the predominant mechanism could be ascribed to the result of a hopping type. The ac conductivity measurements were also carried out for thin film of SC2O3 at temperatures between 4 and 295 K [10]. The conductivity was found to obey the relationship of ai(ffl)=Aco which depends on frequency and s is dependent on temperature and is a little lower than unity. By using a classical hop mechanism between randomly distributed localized states, a model was proposed and applied to scandium oxide with the assumption that the localized states are caused by lattice vacancies. The model is expected to be... [Pg.261]

Release of calcium ions to the solution must produce the cation vacancies. Assumption of this mechanism can explain the decreasing Ca/Si ratio on the CjS surface, found by many authors in ESCA studies. It takes place within a few seconds after contact of CjS with water (Fig. 3.10). [Pg.139]

In diffusional processes, such as the classic Kirkendall effect of interdiffusion in a bulk diffusion couple of A and B, the atomic flux of A is not equal to the opposite flux of B. If we assume that A diffuses into B faster than B diffuses into A, we might expect that there will be a compressive stress in B, since there are more A atoms diffusing into it than B atoms diffusing out of it. However, in Darken s analysis of interdiffusion, there is no stress generated in either A or B. But Darken has made a key assumption that vacancy concentration is in equilibrium everywhere in the sample. To achieve vacancy equilibrium, we must assume that lattice sites can be created and/or annihilated in both A and B, as needed. Hence, provided that the lattice sites in B can be added to accommodate the incoming A atoms, there is no stress. The addition of a large number of lattice sites implies an increase in lattice planes if we assume that the mechanism of vacancy creation and/or annihilation is by dislocation climb mechanism. It further implies that lattice planes can migrate. [Pg.150]


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Vacancy mechanism

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