Underpotential alloy deposition

The electrodeposition of alloys at potentials positive of the reversible potential of the less noble species has been observed in several binary alloy systems. This shift in the deposition potential of the less noble species has been attributed to the decrease in free energy accompanying the formation of solid solutions and/or intermetallic compounds [61, 62], Co-deposition of this type is often called underpotential alloy deposition to distinguish it from the classical phenomenon of underpotential deposition (UPD) of monolayers onto metal surfaces [63],... 

Underpotential alloy deposition is particularly well suited for systems where only small amounts of the less noble species are required. The addition of trace quantities... 

An empirical treatment developed by Kolb et al. [81, 82] relating UPD behavior to the difference in work function between the substrate and depositing species has been used to explain anomalous co-deposition behavior observed in Ni-Fe and Ni-Zn alloys [83]. Although the relationship appears to hold for pure underpotential deposition limited to a monolayer, it does not satisfactorily predict bulk alloy behavior. For example, based on work function data alone, one would expect Zn-Al and Sb-Al alloys to be formed by underpotential alloy deposition. Recent reports in the literature, however, indicate that alloying in these systems does not occur [46, 84]. 

Several binary alloys of technological importance are known to form by way of an underpotential co-deposition mechanism. The abnormal composition-potential relationship observed in Cu-Zn alloys deposited from cyanide-based electrolytes, one of the most widely used commercial alloy plating processes, is attributed to the underpotential co-deposition of Zn [64]. The UPD of Zn is also known to occur on Co and Fe and has been included in treatments focusing on the anomalous co-deposition of Co-Zn [65] and Ni-Zn alloys [66-68]. Alloys of Cu-Cd have been shown to incorporate Cd at underpotentials when deposited from ethylene diamine solution [69-71]. 

Fig. 5. Potential regime for underpotential co-deposition process of alloy AB (UPCD). The UPCD regime is indicated relative to OPCD potential range and equilibrium potentials of elemental A and B.

Here, Wg and Wq2 represent temperature and composition independent constants called Margules parameters. The substitution of Eq. (11) into Eq. (7) yields the equilibrium potential of the less noble component in the alloy. If this expression is subtracted from the equilibrium potential of the elemental phase defined by Eq. (1), the relation between the underpotentially co-deposited alloy composition and corresponding value of underpotential can be obtained. The example of this approach is shown in Fig. 6 where the composition of UPCD CoPt and FePt is measured as a function of deposition underpotential. The solid lines in the plot indicate the fit of the asymmetric regular solution model. It is important to note that Eq. (11) combined with Eqs. (7) and (1) suggest that composition of UPCD AB alloys (CoPt and FePt) is not dependent on A and B (Co and Fe) deposition kinetics (concentrations in the solutions). 

Cathodic electrodeposition of microcrystalline cadmium-zinc selenide (Cdi i Zn i Se CZS) films has been reported from selenite and selenosulfate baths [125, 126]. When applied for CZS, the typical electrocrystallization process from acidic solutions involves the underpotential reduction of at least one of the metal ion species (the less noble zinc). However, the direct formation of the alloy in this manner is problematic, basically due to a large difference between the redox potentials of and Cd " couples [127]. In solutions containing both zinc and cadmium ions, Cd will deposit preferentially because of its more positive potential, thus leading to free CdSe phase. This is true even if the cations are complexed since the stability constants of cadmium and zinc with various complexants are similar. Notwithstanding, films electrodeposited from typical solutions have been used to study the molar fraction dependence of the CZS band gap energy in the light of photoelectrochemical measurements, along with considerations within the virtual crystal approximation [128]. 

An alternative type of tip-induced nanostructuring has recently been proposed. In this method, a single-crystal surface covered by an underpotential-deposited mono-layer is scanned at a close tip-substrate distance in a certain surface area. This appears to lead to the incorporation of UPD atoms into the substrate lattice, yielding a localized alloy. This procedure works for Cu clusters on Pt(l 11), Pt(lOO), Au(l 11), and for some other systems, but a model for this type of nanostructuring has not been available until now. (Xiao et al., 2003). 

The catalytic properties of a Pt/Sn combination were observed on different kinds of electrode materials alloys [90], electro co-deposits of Pt and Sn [89, 90], underpotential deposited tin [42] or a mixture of tin oxide and platinum deposited on glass [95], All different materials present a marked influence on methanol electrooxidation. 

Surface limited reactions are well known in electrochemistry, and are generally referred to as underpotential deposits (UPD) [83-88], That is, in the deposition of one element on a second, frequently the first element will form an atomic layer at a potential under, or prior to, that needed to deposit the element on itself. One way of looking at UPD is that a surface compound, or alloy, is formed, and the shift in potential results from the free energy of formation of the surface compound. 

Underpotential deposition of Zn on Au(lOO) inO.lM Na2S04was investigated by in situ XANES to obtain an indication of alloy formation. ... 

Underpotential deposition of Zn ions on polycrystalline Ag was investigated in IM KOH to form two kinds of alloys."" ... 

---