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Thin-film multilayer processing additive approach

Figure 18. Additive approach for processing thin-film multilayer structures. Figure 18. Additive approach for processing thin-film multilayer structures.
Surfactants also reduce the coalescence of emulsion droplets. The latter process occurs as a result of thinning and disruption of the liquid film between the droplets on their close approach. The latter causes surface fluctuations, which may increase in amplitude and the film may collapse at the thinnest part. This process is prevented by the presence of surfactants at the O/W interface, which reduce the fluctuations as a result of the Gibbs elasticity and/or interfacial viscosity. In addition, the strong repulsion between the surfactant layers (which could be electrostatic and/or steric) prevents close approach of the droplets, and this reduces any film fluctuations. In addition, surfactants may form multilayers at the O/W interface (lamellar liquid crystalline structures), and this prevents coalescence of the droplets. [Pg.515]


See other pages where Thin-film multilayer processing additive approach is mentioned: [Pg.490]    [Pg.103]    [Pg.461]    [Pg.173]    [Pg.258]    [Pg.3]    [Pg.257]    [Pg.304]    [Pg.372]    [Pg.516]    [Pg.752]    [Pg.6]   
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