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Thermal doping

Ct203 (0-1) - HCHO thermal doped VaOs. Doped sample 30-50% more active than pure detection if proportional to Cr tion ... [Pg.238]

X-ray diffraction measurements were made to investigate the ordered structure in the as-thermally-doped complexes [53]. The x-ray patterns for complexes with various PANi DBSA ratios isothermally treated at 100°C for 20 min were examined... [Pg.158]

It was found that that in the case of soft beta and X-ray radiation the IPs behave as an ideal gas counter with the 100% absorption efficiency if they are exposed in the middle of exposure range ( 10 to 10 photons/ pixel area) and that the relative uncertainty in measured intensity is determined primarily by the quantum fluctuations of the incident radiation (1). The thermal neutron absorption efficiency of the present available Gd doped IP-Neutron Detectors (IP-NDs) was found to be 53% and 69%, depending on the thicknes of the doped phosphor layer ( 85pm and 135 pm respectively). No substantial deviation in the IP response with the spatial variation over the surface of the IP was found, when irradiated by the homogeneous field of X-rays or neutrons and deviations were dominated by the incident radiation statistics (1). [Pg.507]

Easier V, Schweiss P, Meingast C, Obst B, Wuhl H, Rykov A I and Tajima S 1998 3D-XY critical fluctuations of the thermal expansivity in detwinned YBa2Cu30y g single crystals near optimal doping Phys. Rev. Lett. 81 1094-7... [Pg.663]

Silane, pure or doped, is used to prepare semiconducting siUcon by thermal decomposition at >600° C. Gaseous dopants such as germane, arsine, or diborane maybe added to the silane at very low concentrations in the epitaxial growing of semiconducting siUcon for the electronics industry. Higher silanes, eg, Si H and Si Hg, are known but are less stable than SiH. These are analogues of lower saturated hydrocarbons. [Pg.299]

Fig. 1. Band-edge energy diagram where the energy of electrons is higher in the conduction band than in the valence band (a) an undoped semiconductor having a thermally excited carrier (b) n-ty e doped semiconductor having shallow donors and (c) a -type doped semiconductor having shallow acceptors. Fig. 1. Band-edge energy diagram where the energy of electrons is higher in the conduction band than in the valence band (a) an undoped semiconductor having a thermally excited carrier (b) n-ty e doped semiconductor having shallow donors and (c) a -type doped semiconductor having shallow acceptors.
Instead of depending on the thermally generated carriers just described (intrinsic conduction), it is also possible to deUberately incorporate various impurity atoms into the sihcon lattice that ionize at relatively low temperatures and provide either free holes or electrons. In particular. Group 13 (IIIA) elements n-type dopants) supply electrons and Group 15 (VA) elements (p-type dopants) supply holes. Over the normal doping range, one impurity atom supphes one hole or one electron. Of these elements, boron (p-type), and phosphoms, arsenic, and antimony (n-type) are most commonly used. When... [Pg.530]

This boron- and carbon-doped SiC exhibits excellent strength and stiffness, extreme hardness, and thermal and chemical resistance. The strength of this system is not affected by temperatures up to I650°C. Creep is virtually nonexistent up to I400°C. CycHc durabiUty testing conducted at I370°C in air showed no deterioration of strength after 3500 h (94). [Pg.466]

Materials made of siHcon nitride, siHcon oxynitride, or sialon-bonded siHcon carbide have high thermal shock and corrosion resistance and may be used for pump parts, acid spray nozzles, and in aluminum reduction ceUs (156—159). A very porous siHcon carbide foam has been considered for surface combustion burner plates and filter media. It can also be used as a substrate carrying materials such as boron nitride as planar diffusion source for semiconductor doping appHcations. [Pg.469]

These equations represent expressions for the extrinsic ionic conductivity of the material as exhibited by the shortened defect notation of equation 12, showing that Na vacancies are created by doping and not primarily generated from thermal energy. [Pg.352]

Semiconducting Ceramics. Most oxide semiconductors are either doped to create extrinsic defects or annealed under conditions in which they become non stoichiometric. Although the resulting defects have been carefully studied in many oxides, the precise nature of the conduction is not well understood. Mobihty values associated with the various charge transport mechanisms are often low and difficult to measure. In consequence, reported conductivities are often at variance because the effects of variable impurities and past thermal history may overwhelm the dopant effects. [Pg.357]


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See also in sourсe #XX -- [ Pg.90 ]




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