Tetrahydropyranyl methacrylate

A novel coil-rod-coil triblock copolymer, where the rod block was polyflu-orene, PF, and the coil blocks poly(2-tetrahydropyranyl methacrylate),... 

Scheme 2.7 Schematic chemical structures of Poly(cylohexyl methacrylate) (PCHMA), Poly(4-tetrahydropyranyl methacrylate) (P4THPMA) and poly(l,3-dioxan-5-yl-methacrylate) (PDMA). (From ref. [38])...

Positive tone resins based on a photoacid generator and either a random copolymer of tetrahydropyranyl methacrylate and methyl methacrylate [137] or random copolymers of tetrahydropyranyl methacrylate, methyl methacrylate, and t-butyl methacrylate (180) were used for fabrication of 3D microchannel structures [264], Simple placed channels connected to cubic or prismatic trenches, which are open to the surface as well as optical grating structures, comprise a set of several parallel channels placed about 10 pm below the surface with connecting reservoirs on both ends. They were fabricated by positive TP microlithography (Fig. 3.75) [264]. 

Another interesting acrylate polymer for 193 nm lithography is a terpolymer of tricyclo[5.2.1.02 6]decanyl acrylate, tetrahydropyranyl methacrylate, and methacrylic acid (Fig. 58) [237]. In conjunction, new alkylsulfonium salts for use in ArF excimer laser lithography have been synthesized [238]. Methyl-(cyclohexyl)(2-oxocyclohexyl)sulfonium and methyl(2-norbonyl)(2-oxocy-clohexyl)sulfonium triflates are highly transparent with their absorption coefficients of 1125 and 1650 L/mofrcm at 193 nm in sharp contrast with... 

Methacrylate terpolymer based on poly(ticyclodecanyl methacrylate-co-tetrahydropyranyl methacrylate-co-methacrylic acid) (XXXIV) developed at NEC in 1995. 

Poly(tetrahydropyranyl methacrylate-co-lH,lH-perfluorooctyl methacrylate) carbon dioxide 2004PHA... 

Poly(l,l,2,2-tetrahydroperfluorooctyl acrylate-Z>-vinyl acetate) Poly (tetrahydropyranyl methacrylate-co-lH, IH-perfluorooctyl 314... 

Controlled structure PMAA can be prepared by the deprotection of an appropriate precursor polymethacrylate which has itself been polymerized under living conditions. Both anionic polymerization and GTP have been used to prepare PMAA employing a variety of PMAA precursor monomers such as benzyl methacrylate (125), ter -butyl methacrylate (126), trimethylsilyl methacrylate (127) and 2-tetrahydropyranyl methacrylate (128,129). Removal of the protecting group yields the desired PMMA. 

It was not until the 1970s that the first block polyampholytes were reported (251,252). Anionic polymerization was used to prepare precursor AB diblock copolymers of 2-vinylpyridine lOZ with trimethylsilyl methacrylate (TMSMA). The TMSMA residues were subsequently hydrolyzed to poly(methacrylic acid) residues to yield the corresponding AB diblock polyampholytes. Anionic poljnner-ization has also been employed to prepare other block polyampholytes (253-258). GTP has also been successfully employed for the preparation of block polyampholytes. As with anionic polymerization, protected acid monomers must be employed since methacrylic acid (MAA) cannot be polymerized directly by this technique. A variety of protected monomers have been reported to be suitable as a means of introducing MAA residues, with 2-tetrahydropyranyl methacrylate being the most effective (Fig. 46). 

Here so-called Type I and Type II zwitterionic SCK micelles can be prepared from the hydrophilic-hydrophobic precursors poly(2-(dimethylamino)ethyl methacrylate-6Zoc -2-tetrahydropyranyl methacrylate) (DMAEMA-THPMA) copolymers prepared via group transfer polymerization (128,129,461). Micel-lization of the DMAEMA-THPMA block copolymers in a water/THF mixture... 

The synthesis of shell crosslinked knedel (SCK) micelles has been reported. Various applications, in areas as diverse as solubilisation, catalysis, fillers, coatings and delivery, have been proposed for these nanoparticles. However, in all studies the micelle cores are based on PS or polyisoprene and are therefore permanently hydrophobic. The synthesis of two new classes of SCK micelles with hydrophilic micelle cores are reported. Successftil shell crosslinking relies on. selective quatemisation of the A block, which comprises 2-(dimethylamino)ethyl methacrylate (DMAEMA) residues. The B block comprises 2-(N-morpholino)ethyl methacrylate (MEM A) and forms the micelle core. The second class is zwitterionic SCK micelles, prepared from precursor DMAEMA-2-tetrahydropyranyl methacrylate diblock copolymers. Depending on the synthetic route employed, two types of zwitterionic SCK micelles can be obtained Type I micelles, with anionic cores and cationic coronas, and Type II micelles, with cationic cores and anionic coronas. These zwitterionic SCK micelles exhibit isoelectric points in aqueous solution. 14 refs. 

FIGURE 13.17 Molecular structures of (a) poly(tert-butyl methacrylate)-i>-poly(l,l-dihydroperfluorooctyl acrylate) (PtBMA-fc-PFOMA) and (b) poly(2-tetrahydropyranyl methacrylate)-l -poly( 1,1 -dihydroperfluorooctyl methacrylate) (PHPMA-l -PFOMA). 

Poly(1,1,2,2-tetrahydroperfluorodecyl methacrylate) Poly(tetrahydropyranyl methacrylate-co-lH,lH-perfluorooctyl methacrylate) Poly[2-(3-thienyl)acetyl3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluoro-1 -octanate]... 

Zhou et al. [177] use a random copolymer of tetrahydropyranyl methacrylate (THPMA) and methyl methacrylate (MMA) polymer doped with BSB-S2 as the PAG for microfabrication. At the laser focal spot, the THPMA groups were converted to carboxylic acid groups due to photogenerated acid-induced ester cleavage reactions, and were therefore rendered soluble in aqueous base developer. Figure 45 shows the 3D microstructure produced by this method. By two-photon fluorescence imaging, it was found that the buried channels are open and a continuous connection was made between the two cavities. 

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