Terf-Butyl ester resists

For subsequent transformations, it was necessary to protect the amino and C-2 carboxyl groups of fra/w-4-hydroxy-L-proline 34. Throughout all of the synthetic work to be described, A-benzoyl amide protection was chosen as it was felt likely that such a functional group would be resistant to most reaction conditions. Initially, a C-2 terf-butyl ester was chosen in an attempt to maximize the stereoselectivity in the planned enamine alkylation reaction however, later experiments revealed that the more straightforward to introduce C-2 methyl ester was equally effective. The preparations for all of the derivatives used are described here. 

Acetals and ketals have attracted a great deal of attention recently as protecting groups of PHOST due to their lower activation energies of deprotection than fBOC and terf-butyl esters. While the majority of chemical amplification resists require PEB to accelerate acid-catalyzed reactions, deprotection of ac-... 

A new type of copolymer resist named ESCAP (environmentally stable chemical amplification photoresist) has recently been reported from IBM [163], which is based on a random copolymer of 4-hydroxystyrene with tert-butyl acrylate (TBA) (Fig. 37), which is converted to a copolymer of the hydroxystyrene with acrylic acid through photochemically-induced acid-catalyzed deprotection. The copolymer can be readily synthesized by direct radical copolymerization of 4-hydroxystyrene with tert-butyl acrylate or alternatively by radical copolymerization of 4-acetoxystyrene with the acrylate followed by selective hydrolysis of the acetate group with ammonium hydroxide. The copolymerization behavior as a function of conversion has been simulated for the both systems based on experimentally determined monomer reactivity ratios (Table 1) [164]. In comparison with the above-mentioned partially protected PHOST systems, this copolymer does not undergo thermal deprotection up to 180 °C. Furthermore, as mentioned earlier, the conversion of the terf-butyl ester to carboxylic acid provides an extremely fast dissolution rate in the exposed regions and a large... 

Several polymethacrylates, primarily alkyl esters, were compared with a novolac resist in terms of etch rates in CF4 and Ar plasmas. The alkyl groups examined included methyl, terf-butyl, cyclohexyl, norbonyl, adamantyl, and benzyl [226]. The polymerization of alicyclic methacrylates was pioneered by Otsu, who has demonstrated facile polymerization of bulky methacrylates and reported high Tg of this class of polymethacrylates [230]. It has been found that alicyclic polymers exhibit better dry etch resistance than acyclic esters and that the dry etch durability is increased by an increase in the number of rings. Thus, poly(adamantyl methacrylate) is as stable as a novolac resist under dry etch conditions. A 30/70 copolymer of adamantyl methacrylate with ter/-butyl... 

Vinyl acetate is fairly water soluble and somewhat deficient in hydrolytic stability. The incorporation of a vinyl ester of the higher branched carboxylic acids into a copolymer system improves the resistance of the product to hydrolysis. Thus the latex formed in Preparation 5-10 has been used in formulating exterior paints. Copolymers of vinyl acetate with increasing concentrations of vinyl 2-ethylhexanoate (VEH) were prepared by a procedure similar to that of Preparation 5-10, except that the initiator system consisted of terf-butyl hydroperoxide and sodium formaldehyde sulfoxylate, and the buffer was sodium acetate. As the level of VEH increased, the hydrolytic stability of the copolymer increased significantly [169],... 

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