Temperature thin-film materials

The primary methodologies for forming thin-film materials with atomic level control are molecular beam epitaxy (MBE) [4-9], vapor phase epitaxy (VPE) [10-12], and a number of derivative vacuum based techniques [13]. These methods depend on controlling the flux of reactants and the temperature of the substrate and reactants. 

Two types of samples were prepared for detailed morphological examination. Sections of the as-polymerized material were examined directly by WAXS and DSC. Samples also were prepared by casting films from a solution of the polymer in dimethyl formamide (DMF) at 52°C. Solvent was allowed to slowly evaporate, and the films were dried by annealing for 670 hr at 52°C, followed by slow cooling to room temperature. Thin films suitable for electron microscopy were cast from 0.5 wt % polymer in DMF onto clean glass slides, and after 20 hr of annealing at 52°C, floated off on distilled water and mounted on 300-mesh copper grids. 

Lin M-T, El-Deiry P, Chromik RR, Barbosa N, Brown WL, Delph TJ, Vinci RP. Temperature-dependent microtensile testing of thin film materials for application to microelectromechanical system. Microsyst Technol 2006 12(10-11) p 1045-1051. 

There also exists a relationship between u-axis length and superconducting transition temperature in Nb-based A15 materials [58]. Noolandi and Testardi compiled experimental data which showed a direct correlation between an increase in -axis spacing (Aa/oo) and degradation in (-A7].). According to this empirical relationship, thin film materials with optimum values have a smaller a-axis lattice spacing than bulk A15 samples or thin film samples with non-optimum 7].s. That is, as the a-axis decreases from its equilibrium value (e.g., 5.167 A for NbiGe), a concomitant increase in... 

The optical behaviour of silver island films embedded in optical thin film materials has been studied by spectrophotometry. The silver cluster surface plasmon absorption line position and width strongly depend on deposition temperature and ambient material. Electron micrographs of the samples allow to establish the correlation between silver cluster geometry and optical behaviour. The first results of Rigorous Coupled Wave Approximation (RCWA) calculations reproduce the spectrophotometric experimental results. 

DMA has not traditionally been used by the board fabrication industry however, some evidence suggests that this technique might be a better differentiator for and indicator of a materials inherent thermal stability in the LEA reflow environment since it combines temperature with torsional oscillation. Additionally, this test has the advantage of being very sensitive and accurate with thin film materials. 

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