Tantalum ionic halides

Between 1980 and about 2000 most of the studies on the electrodeposition in ionic liquids were performed in the first generation of ionic liquids, formerly called room-temperature molten salts or ambient temperature molten salts . These liquids are comparatively easy to synthesize from AICI3 and organic halides such as Tethyl-3-methylimidazolium chloride. Aluminum can be quite easily be electrode-posited in these liquids as well as many relatively noble elements such as silver, copper, palladium and others. Furthermore, technically important alloys such as Al-Mg, Al-Cr and others can be made by electrochemical means. The major disadvantage of these liquids is their extreme sensitivity to moisture which requires handling under a controlled inert gas atmosphere. Furthermore, A1 is relatively noble so that silicon, tantalum, lithium and other reactive elements cannot be deposited without A1 codeposition. Section 4.1 gives an introduction to electrodeposition in these first generation ionic liquids. 

We were quite optimistic in the beginning as the second reduction process corresponds to the formation of a black deposit which was potentially the first electrochemical route to make thick tantalum layers. After having washed off all ionic liquid from the sample we were already a bit sceptical as the deposit was quite brittle and did not look metallic. The SEM pictures and the EDX analysis supported our scepticism and the elemental analysis showed an elemental Ta/Cl ratio of about 1/2. Thus, overall we have deposited a low oxidation state tantalum choride. Despite the initial disappointment we were still eager to obtain the metal and found some old literature from Cotton [122], in which he described subvalent clusters of molybdenum, tungsten and tantalum halides. In the case of tantalum the well-defined Ta6Cli22+ complex was described with an average oxidation number of 2.33 and thus with a Ta/Cl molar ratio very close to 1/2. Such clusters are depicted in Figure 4.15. 

In this chapter we would like to present some plating protocols for the electrodeposition of aluminum, lithium, tantalum and zinc from different ionic liquids. These recipes have been elaborated in our laboratories and should allow the beginner to perform his first electrodeposition experiments. For aluminum we give four different recipes in order to show that the ionic liquid itself can strongly influence the deposition of metals. In the case of tantalum the deposition of the metallic phase is not straightforward as, in unstirred solutions, the more nonstoichiometric tantalum halides form the higher the current density for electrodeposition. Apart from the zinc deposition all experiments should be performed at least under dry air. 

Progress in the preparative and structural fields of protactinium chemistry has been rapid during the past 6 years and there is now sufficient information available, particularly in the halide and oxide fields, to permit a more balanced comparison than has previously been possible with the properties of the actinide elements, on the one-hand, and those of niobium and tantalum, on the other. In this connection one must, of course, bear in mind the fact that the ionic radii of protactinium in its various valence states [Pa(V), 0.90 A and Pa(IV), 0.96 A] are appreciably larger than those of niobium or tantalum and this itself will have a considerable influence on the chemical and crystallographic properties of the elements. 

---