Synthesis of Polyferrocenylsilane Polyions

In addition to forming continuous organometallic multilayer thin films, we explored the LbL deposition of polyferrocenylsilane polyions onto, for instance, hydrophilically/hydrophobically modified substrates with the aim of building two-dimensionally patterned organometallic multilayers. In general, surfaces modified with microscopically patterned conducting, luminescent, or redox-active polymer films have potential use in microelectronic and optoelectronic devices and microsensor arrays. Area-selective deposition of polyferrocenylsilane polyions can be an attractive method to obtain two-dimensionally patterned redox active films, which may be used as electrochemically modulated diffraction gratings.  

Patterned organometallic multilayers may be of interest also as etch barriers in RIE processes. For this purpose it is essential that these films can be fabricated from etch resistant organometallic polyferrocenylsilane chains only, as organic polymers offer no resistance to reactive ion etching. This chapter deals with the formation of continuous organometallic multilayer thin films, and with the fabrication of patterned organometallic thin films, formed by area-selective deposition of organo-metaUic polyions on prepattemed substrates. 

The disilazide reagent has been reported to convert reactive alkyl halides such as benzyl and aUyl chlorides, alkyl bromides, and iodides into primary amines. We were able to expand its utility to the amination of the alkyl chloride moieties employed 

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