Substrate bias voltage

Figure 5. Diamond particle density as a function of substrate bias voltage. During bias pretreatment, the gas pressure was 0.2,2, and 15 torr, and CH4 was (b.12 vol.% (b) 10 vol.% and (c) 40 vol.%.1 (Reproduced with permission.)...

Figure 7. cBN content together with the deposition rate of BN films deposited at different substrate bias voltages by d.c. magnetron sputtering of a boron target. 

Figure 12. Radial distribution of the charge carrier density 10 mm from the substrate surface (hBN target, RF target power 1000W, substrate bias voltage = —150 V, p = 0.2 Pa, 97% Ar, 3% N2).

Figure 13. Total incorporated momentum per deposited atom in dependence on the substrate bias voltage during step 4. In addition the value for optimum cBN nucleation = —150 V 97% Ar/ 3% N2) is shown.

Itoh et al. (1983) report that the perpendicular magnetic anisotropy in Gd-Fe films, when prepared by means of sputtering under low substrate bias voltage, is mainly stress determined. In alloys where the R component is a non-S state ion the... 

Experimentally extracting redox state information from STS has been also pursued. Snyder and White measured STS of Fe-protoporphyrin IX multilayer films adsorbed on graphite electrode in air [82]. They observed an enhancement that was identical for both signs of the tip-substrate bias voltage. The data were interpreted in terms of tunneling via the adsorbate metal centers. 

J.HouSka,J.VI ek, S.Potocky and V.Pefina Influence of substrate bias voltage on strueture and properties of hard Si-B-C-N films prepared by reactive magnetron sputtering Diamond Relaf Matter. 16, (2007), 29-36. 

Flores, M., Huerta, L., EscamiUa, R. et al. 2007. Effect of substrate bias voltage on corrosion of TUSl/Ti multilayers deposited by magnetron sputtering. Applied Surface Science 253 7192-7196. 

Figure 6 Variation of micro Vickers hardness with substrate bias voltage for a TiC film deposited by the HCD process. Inconel 625 substrate substrate temperature 500°C 10 xm thick 25-g load.

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