Spontaneous Deposition of Os on Au

Spontaneous deposition of Os on Au(l 11) was performed by exposure of a clean Au( 111) electrode for a range of deposition times and concentrations of the Os-containing solution (0.01, 0.1, or 1 mM), OSCI3 + 0.1 M H2SO4.21 The CVs recorded in 0.1 M H2SO4, after the potential had been cycled several times from -0.20 to 0.50 V to 

The deposited Os islands were not uniform in size. As the Os solution concentration and the deposition time were increased, the widths and heights of the Os islands increased.21 The range of island widths increased from 1 to 3 nm for 1-min deposition from 0.01 mM OSCI3 solution up to 2-6 nm for 30-min deposition 

The cyclic voltammograms of Os/Au(l 11) prepared by 5-min Os deposition from a 1 mM OsCh solution are presented in Fig. 13, which show Os oxidation/reduction and the subsequent gradual dissolution by extending the positive potential limit. The potential window was extended positively by intervals of 100 mV and three cycles 

STM images recorded on a smaller scale of27 x 27 nm2, shown in Fig. 14c, d, enabled a closer examination of the structure and 

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