Spin-cast polystyrene films

Figure 1. Ratio of excimer (le) to monomer (Im) fluorescence intensifies of spin cast polystyrene films as a function of (spin speed)...

F. 2.1 Power spectral density of an ho = 18 nm and Af = 2.3 kg/mol spin-cast polystyrene film, freshly jwepared (plain solid line) and after annealing for 7202 s (open squares) at 85 °C (Repoduced with permission from Ref. [13])... 

Zink et al. used a blend of polystyrene (hPS) and its deuterated counterpart (dPS), both of molecular weight 1.95 x 106 (abbreviated 1.95 M). The average volume fraction (4>dPS) of deuterated polystyrene was 30%. The polymers were dissolved in toluene and spin cast on thin silicon wafers (about 10 x 10 mm), the resulting film thickness being about 300 nm. The samples were annealed at 245°C for 8 days, and the measurement of the resulting depth profiles was conducted by NRA using a monoenergetic 700 keV 3He beam. The nuclear reaction employed can be written ... 

Figure 2. Time dependence for 600K MW polystyrene films spin cast at 8,000 rpm and annealed at different temperatures.

Figure 19.4 (A) Extinction spectra of silver nanoparticle films used for PtOEP emission enhancement. (B) Corresponding excitaticm spectra monitored at 650 mm of 6 nm films of PtOEP in a polystyrene binder spin cast onto the silver films. (C) Excited state decay dynamics of the PtOEP phosphorescence for 6 nm films excited by S ns pulses at 332 nm with no silver (c) and on substrates like number 4 from A with silver coverage to optimize enhancement (b). The instrument resolution when detecting scattering of the excitation pulse (a) is shown for reference. Reprinted from reference 43 with permission of the American Chemical Society.

Raczkowska, J., Bemasik, A., Budkowski, A., Sajewicz, K., Penc, B., Lekki, J., Lekka, M., Rysz, J., Kowalski, K., Czuba, R Stmctures formed in spin-cast films of polystyrene blends with poly(butyl methacrylate) isomers. Macromolecules 37(19), 7308-7315 (2004)... 

In this example, we have applied RF GD-TOFMS operating in pulsed mode to characterize two films spin-casted on Si wafer a thin PMMA film (poly(methylme-thacrylate) Figure 41.13A) and a thin PS film (polystyrene Figure 41.13B). 

Each layer that makes up the superlattice stack was spin cast, floated, and then collected as described below. The solvent used for spin casting was toluene. Given the lower volatility of toluene, it was found that a more uniform film could be obtained. However, these films are noticeably thinner than those spun with higher volatility solvents. This meant that a higher polymer concentration had to be used. Another reason for using toluene was that it was used previously in creating polystyrene films, and a concentration for a desired film thickness had been predetermined. 

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