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Silicone unmodified

Amongst the earliest measurements involving chemical functionality of the probe were those of Nakagawa et al. [69]. They investigated octadecyltrichlorosilane (OTS) chemically modified tips against chemically adsorbed monolayers of different alkyl-trichlorosilanes in ethanol, as shown schematically in Figure 14. When both tip and surface were modified by OTS, a large adhesive force was observed that was not present for the case of an unmodified silicon nitride tip on an OTS-modified surface. Additionally there... [Pg.42]

Fig. 52 Silicon-29 CP/MAS spectrum of silica gel modified by the introduction of a phosphine linker. The signal at highest field (ca. -110 ppm) is due to unmodified Si04 centres, the other four to the structural fragments shown (clockwise)... Fig. 52 Silicon-29 CP/MAS spectrum of silica gel modified by the introduction of a phosphine linker. The signal at highest field (ca. -110 ppm) is due to unmodified Si04 centres, the other four to the structural fragments shown (clockwise)...
Unmodified PMMA is brittle, strain at break is low. When modified with 10 and 25 parts by weight of PMMA grafted silieone particles, PMMA becomes tough yield points are observed in the stress-strain curves and strain at break is enhanced. Stress at break decreases with increasing modifier content. The tensile modulus E determined by the slope at the origin of the stress-strain curve, proportionally decreases with increasing content of silicone modifier. [Pg.683]

Property Method (Unmodified) Silicone) Silicone) Silicone)... [Pg.196]

As mentioned above, the dispersion stability of the slurry is directly related with CMP performance, removal rate, within-wafer nonuniformity (WIWNU), which is defined as the standard deviation divided by the average of remaining thickness after CMP, microscratching, and the remaining particle on the wafer. To avoid poor CMP performance, the dispersion stability of the slurry must be controlled by preventing silicon ion dissolution. Surface modification of the silica particle was produced by addition of an organic additive. Without surface modification, the amount of silicon dissolution was 1.370 0.002 mol/L, while surfaces modified with poly(vinylpyrrolidone) (PVP) polymer yielded a dissolution of 0.070 0.001 mol/L, almost 20 times less than the unmodified surface. [Pg.183]

The number of microscratches and remaining silica particles for the modified slurry is much less than for unmodified slurry. PVP, which modifies the silica particles and plays a preventive role in dissolving silicon ions, is thought to improve the suspension stability. Due to the surface modification, microscratches on the silicon wafer are decreased, as improved suspension stability prevented the undesirable agglomeration, hi addition, as the reactivity of silicon ion with the silicon wafer is much higher than that of silica particles, the number of... [Pg.183]

AFM investigations of unmodified and C60-functionalized PVFA-co-PVAm layers on a flat silica layer-deposited on a silicon wafer-are shown in Fig. 10. The fullerene functionalized PVFA-co-PVAm/silica layer causes holes with a diameter of 10 nm and depth of 2 nm. The former PVFA-co-PVAm layer has a thickness of about 1.2 nm. This shows the strong influence of reacted C6o molecules on the conformation of the adsorbed polymer layer. These holes observed are also an indication that fullerene aggregates are encapsulated in the PVFA-co-PVAm layer on silica. [Pg.64]


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See also in sourсe #XX -- [ Pg.114 ]




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