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Silicon polishing

Slurry usage in CMP falls into three categories silicon polishing, dielectric CMP, and metal CMP. Within the latter two categories fall a variety of slurries depending on the specific material being polished. The chemistry and related issues are discussed elsewhere in this book. There are, however, a couple of points related to slurry that bear on CMP tool performance. [Pg.37]

GP-RA-159 Silicone Polish Additive GP-121 Silicone Polish Additive GP-227 Silicone Surfactant Solution... [Pg.218]

Thermal oxidation or deposition. The silicon polished wafers are heated in the diffusion furnaces at high temperature ranging between 700 and 1300°C and exposed to a reactive atmosphere of water and ultrapure oxygen under carefully controlled conditions forming an... [Pg.473]

Uses 0/w emulsifier, lubricant, detergent, dispersant, solubilizer, defoamer for cosmetics, household, silicone polish, and mold release prods. [Pg.237]

See other pages where Silicon polishing is mentioned: [Pg.8]    [Pg.24]    [Pg.25]    [Pg.85]    [Pg.159]    [Pg.159]    [Pg.188]    [Pg.210]    [Pg.521]    [Pg.556]    [Pg.29]    [Pg.287]    [Pg.461]    [Pg.145]    [Pg.145]    [Pg.87]    [Pg.1171]    [Pg.2344]    [Pg.5085]    [Pg.5213]    [Pg.5450]    [Pg.5679]    [Pg.5792]    [Pg.2185]    [Pg.2554]    [Pg.2571]    [Pg.2598]    [Pg.2636]    [Pg.2702]    [Pg.2765]    [Pg.2812]   
See also in sourсe #XX -- [ Pg.477 ]



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