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Silicon-oxygen complexes

Dove and Elston, this interfadal layer can be described by a triple layer snrface com-plexation model (TLM) as shown in Fig. 4.31. The interface consists of three electrostatically charged regions, each with an associated electric potential and snrface charge these are termed the o, p, and d planes. Hydrogen ions are permitted to coordinate with the nnsatnrated sites of the interface at the innermost o layer. Sodinm is positioned at the P layer or the d layer. The surface silicon-oxygen complex may have a different chemical character depending on the adsorbed species, hi a sodium chloride solution the surface complexes can be represented as sSiOHaCl, sSiOHj, =SiOH, =SiO-Na, and SiO". The concentration of each species depends on pH and salt concentration, and the sum of the fractions of these surface species equals 1 ... [Pg.153]

Absorption bands silica films, 357,358f sllloon-oarbon complexes, 213,214f silicon-oxygen complexes, 209,211... [Pg.428]

Alkyl silyl ethers are cleaved by a variety of reagents Whether the silicon-oxygen or the carbon-oxygen bond is cleaved depends on the nature of the reagent used Treatment of alkoxysilanes with electrophilic reagents like antimony tri-fluonde, 40% hydrofluonc acid, or a boron tnfluonde-ether complex results in the cleavage of the silicon-oxygen bond to form mono-, di-, and tnfluorosiloxanes or silanes [19, 20, 21) (equations 18-20)... [Pg.205]

Unfortunately, there has been little computational work on these interesting complexes hence, we will mostly consider complexes formed with shallow-level defects in the next section. There has, however, been a treatment of hydrogen-sulfur complexes in silicon by Yapsir et al. (1988) and a recent treatment of hydrogen-oxygen complexes by Gutsev et al. (1989), which we now describe. [Pg.540]

Another modification of the double silylation process reported by Tanaka and co-workers involves the use of a bis(hydrosilane) instead of a disilane as the reactant molecule.61 This reaction can be described as a dehydrogenative double silylation, in that two Si-H bonds are activated rather than an Si-Si bond. The system is best catalyzed by Pt(CH2=CH2)(PPh3)2 other Pt, Pd, Ru, and Rh complexes give only very low yields of the double-silylated products. Alkynes, alkenes, and dienes undergo reaction with the bis (hydrosilane) with a range of results. Silicon-oxygen bonds and silicon-nitrogen bonds can also be formed by this method and are discussed in the appropriate sections later. [Pg.217]

The chemistry of silicon oxygen compounds with SiOs and SiC>6 skeletons in aqueous solution is of special interest. It has been speculated that such Si(IV) complexes with ligands derived from organic hydroxy compounds (such as pyrocatechol derivatives, hydroxycarboxylic acids, and carbohydrates) may play a significant role in silicon biochemistry by controlling the transport of silicon. [Pg.537]

Amorphous silicas play an important role in many different fields, since siliceous materials are used as adsorbents, catalysts, nanomaterial supports, chromatographic stationary phases, in ultrafiltration membrane synthesis, and other large-surface, and porosity-related applications [16,150-156], The common factor linking the different forms of silica are the tetrahedral silicon-oxygen blocks if the tetrahedra are randomly packed, with a nonperiodic structure, various forms of amorphous silica result [16]. This random association of tetrahedra shapes the complexity of the nanoscale and mesoscale morphologies of amorphous silica pore systems. Any porous medium can be described as a three-dimensional arrangement of matter and empty space where matter and empty space are divided by an interface, which in the case of amorphous silica have a virtually unlimited complexity [158],... [Pg.85]

More complex, but still discrete silicate groupings have been found to exist in the minerals benitoite and beryl the former, BaTiSi309, contains six-membered silicon-oxygen rings, whereas the latter, BesAUSieOig, contains twelve-membered rings (Fig. 17-3). [Pg.271]

All these reasons have prompted us to perform nonempirical quantum-chemical calculations that could clarify the problem. Zelenkovskii (16) carried out such computations of adsorption complexes with HzO and NH3 molecules. Figure 9 shows two types of adsorption of water, where adsorption is considered either (a) on the face or (b) on the edge of a silicon-oxygen tetrahedron. The calculations involved a series of adsorption complexes with different distances R between the oxygen atom of water and a silicon atom and with various values of angle a. describing the deviation from the tetrahedral configuration. STO-3G, STO-3G, and 3-21G basis sets were used in these computations. [Pg.156]

The two five-membered rings of this spirocyclic X. Si-silicon(IV) complex each contain two oxygen atoms, one nitrogen atom, one carbon atom, and one (pentacordinate) silicon atom. As shown in Scheme 8, this compound was prepared by analogy to the synthesis of the related A, Si-silicates 10-16. Thus, treatment of (MeO)3SiCH2NMe2 with two mole equivalents of acetohydroxamic acid in acetonitrile at room temperature yielded 28 in 80 % yield as a crystalline solid [5]. The formation of this compound can be understood in terms of a reaction of (MeO)3SiCH2NMe2 with the 1,2-diol acetohydroximic acid, which is a tautomer of acetohydroxamic acid. [Pg.442]

Obviously the formation of a strong silicon-oxygen bond is also assumed to be the driving force in these rearrangements. In the presence of isonitriles, no silyl shift could be induced in complexes 3 and 4. [Pg.557]

The explicit correlation between changes in the minority carrier life time for p -n diodes upon irradiations at different temperatures and changes in the concentration of vacancy and vacancy-oxygen complexes is established. The information obtained in the present work on the electronic parameters of the V 0 complexes and their introduction rates can be used for careful controlling the carrier lifetime and, therefore, the switching characteristics of silicon power devices. [Pg.635]

Magnesium aluminum silicate is a polymeric complex of magnesium, aluminum, silicon, oxygen, and water. The average chemical analysis is conventionally expressed as oxides ... [Pg.418]


See other pages where Silicon-oxygen complexes is mentioned: [Pg.810]    [Pg.211]    [Pg.211]    [Pg.810]    [Pg.211]    [Pg.211]    [Pg.416]    [Pg.185]    [Pg.376]    [Pg.398]    [Pg.24]    [Pg.205]    [Pg.222]    [Pg.686]    [Pg.352]    [Pg.316]    [Pg.978]    [Pg.1390]    [Pg.372]    [Pg.432]    [Pg.6]    [Pg.321]    [Pg.489]    [Pg.299]    [Pg.557]    [Pg.55]    [Pg.205]    [Pg.1074]    [Pg.143]    [Pg.37]    [Pg.44]    [Pg.282]    [Pg.208]   


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