Silicon-nitrogen bond

Nitrogen-silicon bonds. The reaction of ethylenimine with chlorosil nee gives products in which the axiridine ring is attached to ailioon. 7... 

Recent advances in the Staudinger reaction of tertiary phosphines with azido compounds have been reviewed.The reaction of the alkynylphosphine (88) with phenylazide yields the unstable intermediate (89), which in the presence of protic substances undergoes nucleophilic addition to the triple bond. The reactivity of the nitrogen-silicon bond of the phosphinimine derived from triphenylphosphine and trimethylsilylazide has been exploited in reactions with chloroformyl reagents to generate new functionalised phosphinimines, e.g., (90). ... 

The reaction involves initial insertion of sulfur trioxide into the nitrogen-silicon bond of anilinotrimethylsilane 466 the sulfamic acid 467 was, however, contaminated with small amounts of anilinium salts. It was discovered that the reaction of anilinotrimethylsilane 466 with trimethylsilyl chlorosulfonate 459 gave improved yields of the pure sulfamic acid 467. Trimethylsilyl chlorosulfonate 459 will effect the sulfosilation of aromatic hydrocarbons to give the trimethylsilyl arenesulfonates 468 (Equation 148). 

Interestingly, this ligand type is not new and was previously been described by Roesky and co-workers (209) from the reactions of TiX4 (X = Cl, Br) with Me2NC(S)SN(SiMe3)2, a result of the cleavage of both nitrogen-silicon bonds (Eq. 209). 

In the and NMR spectra of 15c, the butyl moiety was observed to indicate that the nitrogen-silicon bond of the monomer was maintained during the polymerization. The Si NMR spectra showed sharp signals indicating a highly ordered alternating structure of the polymer. 

Mixing trichlorosilane, acetonitrile and diphenylsulphoxide, carried out at 10°C, detonated. This accident was put down to the exothermic addition reaction of the silicon-hydrogen bond on the carbon-nitrogen triple bond of nitrile. Other interpretations are possible for instance, the effect of traces of hydrogen chloride formed by the hydrolysis of chlorosilane on acetonitrile. 

When a thin liquid film with a thickness of approximately 2 pm prepared by spin coating of a 15% benzene solution of polymer 1 was irradiated with a 500-W Xe-Hg lamp for 300 s in air, a transparent solid film was obtained. The UV spectrum of this solid film shows that an absorption at 235 nm due to phenyldisilanyl units vanishes after UV-irradiation (Figure 1). This clearly indicates that photolytic cleavage of silicon-silicon bonds leading to the cross-linking occurred. Similar photolysis of the thin liquid films under a nitrogen atmosphere again afforded transparent solid films whose UV spectra show no absorption at 235 nm due to phenyldisilanyl units. 

Silicon-carbon and silicon-nitrogen multiply bonded compounds... 

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