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Silicon monocrystal

The developed prototype includes a source of ultraviolet (UV) radiation (1) with the wavelength of 350 nm, two photodiodes (2 and 3) based on a silicon monocrystal and placed at the angle of 20-25° relative to the plate with sNPS layer (4) and a photodiode (5) for detection of the incident UV light (Fig. 9.6). Upon adsorption of biomolecules the level of the sNPS photoluminescence and the output of the voltage of the consecutively connected photo detectors decrease. Use of two photodetectors of photoluminescence increases the biosensor sensitivity. [Pg.94]

Talanin, V.I. Talanin, I.E. (2006a). Formation of grown-in microdefects in dislocation-free silicon monocrystals. In New research on semiconductors, T.B. Elliot,(Ed.), 31-67, Nova Science Publishers, Inc., ISBN 1-59454-920-6, New York, USA. [Pg.632]

Silicon wafer surfaces have been chosen because of their high reproducible chemical quality and very small residual roughness. A silicon wafer was a slab of a silicon monocrystal (cut in our case along the [1,1,1] plane), covered by a 20 A thick Si02 layer. The residual roughness, characterized by X-rays reflectivity measurements, was of the order of 4 to 4.5 A. [Pg.161]

Hardness of a-SiC monocrystals (after Shafer, 1964, cited in Silicon Carbide Mineralogy, 1972)... [Pg.121]

Figure 2. Cross-section view of integrated FC electrode on the basis of monocrystal macroporous silicon... Figure 2. Cross-section view of integrated FC electrode on the basis of monocrystal macroporous silicon...
The purpose of this work is a study of changes in morphology, optical properties, crystal and electronic structure of monocrystal silicon after plasma processing, depending on the initial voltage of MPC. [Pg.495]

Inamura, T. et al.. Renormalized molecular d5mamics simulation of crack initiation process in machining defectless monocrystal silicon. Bull JSPE, 63.1 (1998) 86. [Pg.28]

For instance, the most common orders of magnitude for energy-band gaps are 5.3 eV (511 kj/mol) for diamond-type la, showing its excellent electric insulating properties, and 1.04 eV (i.e., 100 kJ/mol) for pure silicon (Si) monocrystal used as semiconductors and 0.69 eV (i.e., 67 kJ/mol) for pure germanium (Ge) crystals. The first two examples are both intrinsic semiconductors. Moreover, electrical conductivity of materials is strongly temperature dependent. In fact, as the temperature increases, the conductivity of metals decreases, while the electrical conductivity of pure semiconductors and insulators increases. [Pg.457]

Talanin, V.I. Talanin, I.E. Levinson, D.I. (2002b). Physics of the formation of microdefects in dislocation-free monocrystals of float-zone silicon. Semicond. Sci Cryst Res. Technol, Vol. 17, No. 2, pp. 104-113, ISSN 0268-1242. [Pg.631]

Dependences of thermal oxidation rates are of great importance for silicon carbide device technology. It is not necessary to elaborate special technology for the oxidation of SiC monocrystals. It can be carried out using silicon technology but at higher temperatures. In general, the oxidation process can be described by a linear-parabolic equation. [Pg.417]


See other pages where Silicon monocrystal is mentioned: [Pg.398]    [Pg.239]    [Pg.265]    [Pg.339]    [Pg.574]    [Pg.540]    [Pg.458]    [Pg.472]    [Pg.611]    [Pg.398]    [Pg.239]    [Pg.265]    [Pg.339]    [Pg.574]    [Pg.540]    [Pg.458]    [Pg.472]    [Pg.611]    [Pg.93]    [Pg.348]    [Pg.81]    [Pg.398]    [Pg.433]    [Pg.836]    [Pg.44]    [Pg.3238]    [Pg.3243]    [Pg.836]    [Pg.495]    [Pg.30]    [Pg.458]    [Pg.468]    [Pg.472]    [Pg.425]    [Pg.317]    [Pg.200]   
See also in sourсe #XX -- [ Pg.458 ]




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